Analysis of the negative charges injected into a SiO 2 /SiN x stack using plasma charging technology for field‐effect passivation on a boron‐doped silicon surface
Min, Kwan Hong, Hwang, Jeong‐Mo, Cho, Eunwan, Song, Hee‐eun, Park, Sungeun, Rohatgi, Ajeet, Kim, Donghwan, Lee, Hae‐Seok, Kang, Yoonmook, Ok, Young‐Woo, Kang, Min Gu
Published in Progress in photovoltaics (01.01.2021)
Published in Progress in photovoltaics (01.01.2021)
Get full text
Journal Article
Analysis of the negative charges injected into a SiO 2 /SiN x stack using plasma charging technology for field‐effect passivation on a boron‐doped silicon surface
Min, Kwan Hong, Hwang, Jeong‐Mo, Cho, Eunwan, Song, Hee‐eun, Park, Sungeun, Rohatgi, Ajeet, Kim, Donghwan, Lee, Hae‐Seok, Kang, Yoonmook, Ok, Young‐Woo, Kang, Min Gu
Published in Progress in photovoltaics (04.10.2020)
Get full text
Published in Progress in photovoltaics (04.10.2020)
Journal Article
Analysis of the negative charges injected into a SiO2/SiNx stack using plasma charging technology for field-effect passivation on a boron-doped silicon surface
Min, Kwan Hong, Hwang, Jeong‐Mo, Cho, Eunwan, Song, Hee‐eun, Park, Sungeun, Rohatgi, Ajeet, Kim, Donghwan, Lee, Hae‐Seok, Kang, Yoonmook, Ok, Young‐Woo, Kang, Min Gu
Published in Progress in photovoltaics (04.10.2020)
Get full text
Published in Progress in photovoltaics (04.10.2020)
Journal Article
Analysis of the negative charges injected into a SiO2/SiNx stack using plasma charging technology for field‐effect passivation on a boron‐doped silicon surface
Min, Kwan Hong, Hwang, Jeong‐Mo, Cho, Eunwan, Song, Hee‐eun, Park, Sungeun, Rohatgi, Ajeet, Kim, Donghwan, Lee, Hae‐Seok, Kang, Yoonmook, Ok, Young‐Woo, Kang, Min Gu
Published in Progress in photovoltaics (01.01.2021)
Published in Progress in photovoltaics (01.01.2021)
Get full text
Journal Article