Direct current superposed dual-frequency capacitively coupled plasmas in selective etching of SiOCH over SiC
Yamaguchi, Tsuyoshi, Komuro, Tatsuya, Koshimizu, Chishio, Takashima, Seigo, Takeda, Keigo, Kondo, Hiroki, Ishikawa, Kenji, Sekine, Makoto, Hori, Masaru
Published in Journal of physics. D, Applied physics (18.01.2012)
Published in Journal of physics. D, Applied physics (18.01.2012)
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Journal Article
Simultaneous In situ Measurement of Silicon Substrate Temperature and Silicon Dioxide Film Thickness during Plasma Etching of Silicon Dioxide Using Low-Coherence Interferometry
Koshimizu, Chishio, Ohta, Takayuki, Matsudo, Tatsuo, Tsuchitani, Shigeki, Ito, Masafumi
Published in Japanese Journal of Applied Physics (01.04.2012)
Published in Japanese Journal of Applied Physics (01.04.2012)
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Journal Article
Spatial Distributions of Electron, CF, and CF2 Radical Densities and Gas Temperature in DC-Superposed Dual-Frequency Capacitively Coupled Plasma Etch Reactor Employing Cyclic-C4F8/N2/Ar Gas
Yamaguchi, Tsuyoshi, Kimura, Tetsuya, Koshimizu, Chishio, Takeda, Keigo, Kondo, Hiroki, Ishikawa, Kenji, Sekine, Makoto, Hori, Masaru
Published in Jpn J Appl Phys (25.05.2011)
Published in Jpn J Appl Phys (25.05.2011)
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Journal Article