Data-Driven Optimization of an Industrial Batch Polymerization Process Using the Design of Dynamic Experiments Methodology
Georgakis, Christos, Chin, Swee-Teng, Wang, Zhenyu, Hayot, Philippe, Chiang, Leo, Wassick, John, Castillo, Ivan
Published in Industrial & engineering chemistry research (19.08.2020)
Published in Industrial & engineering chemistry research (19.08.2020)
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Journal Article
Wide spectrum feature selection (WiSe) for regression model building
Rendall, Ricardo, Castillo, Ivan, Schmidt, Alix, Chin, Swee-Teng, Chiang, Leo H., Reis, Marco
Published in Computers & chemical engineering (02.02.2019)
Published in Computers & chemical engineering (02.02.2019)
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Journal Article
Challenges in the Specification and Integration of Measurement Uncertainty in the Development of Data-Driven Models for the Chemical Processing Industry
Reis, Marco S, Rendall, Ricardo, Chin, Swee-Teng, Chiang, Leo
Published in Industrial & engineering chemistry research (23.09.2015)
Published in Industrial & engineering chemistry research (23.09.2015)
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Journal Article
A Systematic Methodology for Comparing Batch Process Monitoring Methods: Part IAssessing Detection Strength
Rato, Tiago J, Rendall, Ricardo, Gomes, Veronique, Chin, Swee-Teng, Chiang, Leo H, Saraiva, Pedro M, Reis, Marco S
Published in Industrial & engineering chemistry research (11.05.2016)
Published in Industrial & engineering chemistry research (11.05.2016)
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Journal Article
A STUDY OF EXPERIMENTAL DESIGN OPTIMALITY FOR WIENER SYSTEMS
Hardjasamudra, Aulia, Rollins, Derrick K., Bhandari, Nidhi, Chin, Swee-Teng
Published in Chemical engineering communications (01.05.2007)
Published in Chemical engineering communications (01.05.2007)
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Journal Article
Polishing layer analyzer and method
Chang, Scott, Acholla, Francis V, Wank, Andrew, Chin, Swee-Teng, Heeschen, William A, Tate, James David, Chiang, Leo H, Gazze, Mark, Tsai, Jeff
Year of Publication 30.04.2019
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Year of Publication 30.04.2019
Patent
Method of manufacturing chemical mechanical polishing pads
Chiang Leo H, Gazze Mark, Heeschen William A, Wank Andrew, Chang Scott, Acholla Francis V, Tsai Jeff, Chin Swee-Teng, Tate James David
Year of Publication 26.09.2017
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Year of Publication 26.09.2017
Patent
Chemical mechanical polishing pad, polishing layer analyzer and method
Chiang Leo H, Gazze Mark, Heeschen William A, Wank Andrew, Chang Scott, Acholla Francis V, Tsai Jeff, Chin Swee-Teng, Tate James David
Year of Publication 22.08.2017
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Year of Publication 22.08.2017
Patent
POLISHING LAYER ANALYZER AND METHOD
Chiang Leo H, Gazze Mark, Heeschen William A, Wank Andrew, Chang Scott, Acholla Francis V, Tsai Jeff, Chin Swee-Teng, Tate James David
Year of Publication 27.07.2017
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Year of Publication 27.07.2017
Patent
CHEMICAL MECHANICAL POLISHING PAD, POLISHING LAYER ANALYZER AND METHOD
Chiang Leo H, Gazze Mark, Heeschen William A, Wank Andrew, Chang Scott, Acholla Francis V, Tsai Jeff, Chin Swee-Teng, Tate James David
Year of Publication 13.07.2017
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Year of Publication 13.07.2017
Patent
METHOD OF MANUFACTURING CHEMICAL MECHANICAL POLISHING PADS
Chiang Leo H, Gazze Mark, Heeschen William A, Wank Andrew, Chang Scott, Acholla Francis V, Tsai Jeff, Chin Swee-Teng, Tate James David
Year of Publication 13.07.2017
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Year of Publication 13.07.2017
Patent
A polishing layer analyzer and method
TATE, JAMES DAVID, GAZZE, MARK, TSAI, JEFF, HEESCHEN, WILLIAM A, CHANG, SCOTT, CHIN, SWEE-TENG, ACHOLLA, FRANCIS V, WANK, ANDREW, CHIANG, LEO H
Year of Publication 10.08.2016
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Year of Publication 10.08.2016
Patent
ANALYSEUR DE COUCHE DE POLISSAGE ET PROCEDE D'ANALYSE L'UTILISANT
CHANG SCOTT, GAZZE MARK, TATE JAMES DAVID, ACHOLLA FRANCIS V, TSAI JEFF, CHIANG LEO H, CHIN SWEE-TENG, HEESCHEN WILLIAM A, WANK ANDREW R
Year of Publication 05.08.2016
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Year of Publication 05.08.2016
Patent
Polierschichtanalysator und Verfahren
Chang, Scott, Acholla, Francis V, Wank, Andrew R, Chin, Swee-Teng, Heeschen, William A, Tate, James David, Chiang, Leo H, Gazze, Mark, Tsai, Jeff
Year of Publication 04.08.2016
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Year of Publication 04.08.2016
Patent