Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
Chiappim, W, Testoni, G E, Doria, A C O C, Pessoa, R S, Fraga, M A, Galvão, N K A M, Grigorov, K G, Vieira, L, Maciel, H S
Published in Nanotechnology (29.07.2016)
Published in Nanotechnology (29.07.2016)
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Journal Article
Physicochemical Characteristics and Antimicrobial Efficacy of Plasma-Activated Water Produced by an Air-Operated Coaxial Dielectric Barrier Discharge Plasma
Miranda, F. S, Tavares, V. K. F, Gomes, M. P, Neto, N. F. Azevedo, Chiappim, W, Petraconi, G, Pessoa, R. S, Koga-Ito, C. Y
Published in Water (Basel) (01.11.2023)
Published in Water (Basel) (01.11.2023)
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Journal Article
Influence of the Al2O3 partial-monolayer number on the crystallization mechanism of TiO2 in ALD TiO2/Al2O3 nanolaminates and its impact on the material properties
Testoni, G E, Chiappim, W, Pessoa, R S, Fraga, M A, Miyakawa, W, Sakane, K K, Galvão, N K A M, Vieira, L, Maciel, H S
Published in Journal of physics. D, Applied physics (18.08.2016)
Published in Journal of physics. D, Applied physics (18.08.2016)
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Journal Article
Atomic layer deposition of TiO2 and Al2O3 thin films for the electrochemical study of corrosion protection in aluminum alloy cans used in beverage
Dias, V M, Chiappim, W, Fraga, M A, Maciel, H S, Marciano, F R, Pessoa, R S
Published in Materials research express (01.07.2020)
Published in Materials research express (01.07.2020)
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Journal Article
Structural, morphological, and optical properties of TiO2 thin films grown by atomic layer deposition on fluorine doped tin oxide conductive glass
Chiappim, W., Testoni, G.E., Moraes, R.S., Pessoa, R.S., Sagás, J.C., Origo, F.D., Vieira, L., Maciel, H.S.
Published in Vacuum (01.01.2016)
Published in Vacuum (01.01.2016)
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Journal Article
Front passivation of Cu(In,Ga)Se-2 solar cells using Al2O3: Culprits and benefits
Curado, M. A., Teixeira, J. P., Monteiro, M., Ribeiro, E. F. M., Vilao, R. C., Alberto, H. V., Cunha, J. M. V., Lopes, T. S., Oliveira, K., Donzel-Gargand, Olivier, Hultqvist, Adam, Calderon, S., Barreiros, M. A., Chiappim, W., Leitao, J. P., Silva, A. G., Prokscha, T., Vinhais, C., Fernandes, P. A., Salome, P. M. P.
Published in Applied materials today (01.12.2020)
Published in Applied materials today (01.12.2020)
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Journal Article
Front passivation of Cu(In,Ga)Se2 solar cells using Al2O3: Culprits and benefits
Curado, M.A., Teixeira, J.P., Monteiro, M., Ribeiro, E.F.M., Vilão, R.C., Alberto, H.V., Cunha, J.M.V., Lopes, T.S., Oliveira, K., Donzel-Gargand, O., Hultqvist, A., Calderon, S., Barreiros, M.A., Chiappim, W., Leitão, J.P., Silva, A.G., Prokscha, T., Vinhais, C., Fernandes, P.A., Salomé, P.M.P.
Published in Applied materials today (01.12.2020)
Published in Applied materials today (01.12.2020)
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Journal Article
Effect of Process Temperature and Reaction Cycle Number on Atomic Layer Deposition of TiO2 Thin Films Using TiCl4 and H2O Precursors: Correlation Between Material Properties and Process Environment
Chiappim, W., Testoni, G. E., de Lima, J. S. B., Medeiros, H. S., Pessoa, Rodrigo Sávio, Grigorov, K. G., Vieira, L., Maciel, H. S.
Published in Brazilian journal of physics (01.02.2016)
Published in Brazilian journal of physics (01.02.2016)
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Journal Article
Influence of the Al 2 O 3 partial-monolayer number on the crystallization mechanism of TiO 2 in ALD TiO 2 /Al 2 O 3 nanolaminates and its impact on the material properties
Testoni, G E, Chiappim, W, Pessoa, R S, Fraga, M A, Miyakawa, W, Sakane, K K, Galvão, N K A M, Vieira, L, Maciel, H S
Published in Journal of physics. D, Applied physics (21.09.2016)
Published in Journal of physics. D, Applied physics (21.09.2016)
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Journal Article
Atomic layer deposition of TiO 2 and Al 2 O 3 thin films for the electrochemical study of corrosion protection in aluminum alloy cans used in beverage
Dias, V M, Chiappim, W, Fraga, M A, Maciel, H S, Marciano, F R, Pessoa, R S
Published in Materials research express (01.07.2020)
Published in Materials research express (01.07.2020)
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Journal Article
Relationships among growth mechanism, structure and morphology of PEALD TiO 2 films: the influence of O 2 plasma power, precursor chemistry and plasma exposure mode
Chiappim, W, Testoni, G E, Doria, A C O C, Pessoa, R S, Fraga, M A, Galvão, N K A M, Grigorov, K G, Vieira, L, Maciel, H S
Published in Nanotechnology (29.07.2016)
Published in Nanotechnology (29.07.2016)
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Journal Article
Relationships among growth mechanism, structure and morphology of PEALD TiO sub(2) films: the influence of O sub(2) plasma power, precursor chemistry and plasma exposure mode
Chiappim, W, Testoni, G E, Doria, A C O C, Pessoa, R S, Fraga, M A, Galvao, N K A M, Grigorov, K G, Vieira, L, Maciel, H S
Published in Nanotechnology (01.07.2016)
Published in Nanotechnology (01.07.2016)
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Journal Article
Synthesis of anatase and rutile phases of TiO2 by atomic layer deposition: Substrate effect
Pessoa, R. S., Pereira, F. P., Testoni, G. E., Chiappim, W., Maciel, H. S., Santos, L. V.
Published in 2014 29th Symposium on Microelectronics Technology and Devices (SBMicro) (01.09.2014)
Published in 2014 29th Symposium on Microelectronics Technology and Devices (SBMicro) (01.09.2014)
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Conference Proceeding