The Role of Carbon and Dysprosium in Ni[Dy]Si:C Contacts for Schottky-Barrier Height Reduction and Application in N-Channel MOSFETs With Si:C Source/Drain Stressors
Lee, R., Koh, A.T.-Y., Kian-Ming Tan, Tsung-Yang Liow, Dong Zhi Chi, Yee-Chia Yeo
Published in IEEE transactions on electron devices (01.11.2009)
Published in IEEE transactions on electron devices (01.11.2009)
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Journal Article
Platinum Germanosilicide as Source/Drain Contacts in P-Channel Fin Field-Effect Transistors (FinFETs)
Lee, R.T.P., Dong Zhi Chi, Yee-Chia Yeo
Published in IEEE transactions on electron devices (01.07.2009)
Published in IEEE transactions on electron devices (01.07.2009)
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Journal Article
Pulsed Laser Annealing of Silicon-Carbon Source/Drain in MuGFETs for Enhanced Dopant Activation and High Substitutional Carbon Concentration
Koh, A.T.-Y., Rinus Tek-Po Lee, Fang-Yue Liu, Tsung-Yang Liow, Kian Ming Tan, Xincai Wang, Samudra, G.S., Balasubramanian, N., Dong-Zhi Chi, Yee-Chia Yeo
Published in IEEE electron device letters (01.05.2008)
Published in IEEE electron device letters (01.05.2008)
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Journal Article
Effect of Si content on laser welding performance of Al-Mn-Mg alloy
ZHAO, Pi-zhi, LIU, Jing, CHI, Zhi-dong
Published in Transactions of Nonferrous Metals Society of China (01.07.2014)
Published in Transactions of Nonferrous Metals Society of China (01.07.2014)
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Journal Article
Erbium silicided Schottky Source/Drain Silicon Nanowire N-Metal–Oxide–Semiconductor Field-Effect Transistors
Tan, Eu Jin, Pey, Kin Leong, Singh, Navab, Chi, Dong-Zhi, Lo, Guo-Qiang, Lee, Pooi See, Hoe, Keat-Mun, Chin, Yoke King, Cui, Guang Da
Published in Japanese Journal of Applied Physics (01.04.2008)
Published in Japanese Journal of Applied Physics (01.04.2008)
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Journal Article
Novel Epitaxial Nickel Aluminide-Silicide with Low Schottky-Barrier and Series Resistance for Enhanced Performance of Dopant-Segregated Source/Drain N-channel MuGFETs
Lee, R.T.P., Tsung-Yang Liow, Kian-Ming Tan, Lim, A.E.-J., Chee-Seng Ho, Keat-Mum Hoe, Lai, M.Y., Osipowicz, T., Guo-Qiang Lo, Samudra, G., Dong-Zhi Chi, Yee-Chia Yeo
Published in 2007 IEEE Symposium on VLSI Technology (01.06.2007)
Published in 2007 IEEE Symposium on VLSI Technology (01.06.2007)
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Conference Proceeding
B-doping of vapour–liquid–solid grown Au-catalysed and Al-catalysed Si nanowires: effects of B2H6 gas during Si nanowire growth and B-doping by a post-synthesis in situ plasma process
Whang, Sung-Jin, Lee, Sungjoo, Chi, Dong-Zhi, Yang, Wei-Feng, Cho, Byung-Jin, Liew, Yun-Fook, Kwong, Dim-Lee
Published in Nanotechnology (11.07.2007)
Published in Nanotechnology (11.07.2007)
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Journal Article
Nickel-Silicide:Carbon Contact Technology for N-Channel MOSFETs With Silicon-Carbon Source/Drain
Lee, R.T.P., Li-Tao Yang, Tsung-Yang Liow, Kian-Ming Tan, Lim, A.E.-J., Kah-Wee Ang, Lai, D.M.Y., Keat Mun Hoe, Guo-Qiang Lo, Samudra, G.S., Dong Zhi Chi, Yee-Chia Yeo
Published in IEEE electron device letters (01.01.2008)
Published in IEEE electron device letters (01.01.2008)
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Journal Article
Demonstration of Schottky Barrier NMOS Transistors With Erbium Silicided Source/Drain and Silicon Nanowire Channel
Eu Jin Tan, Kin-Leong Pey, Singh, N., Guo-Qiang Lo, Dong Zhi Chi, Yoke King Chin, Keat Mun Hoe, Guangda Cui, Pooi See Lee
Published in IEEE electron device letters (01.10.2008)
Published in IEEE electron device letters (01.10.2008)
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Journal Article
N-channel FinFETs With 25-nm Gate Length and Schottky-Barrier Source and Drain Featuring Ytterbium Silicide
Lee, R.T.P., Lim, A.E.-J., Kian-Ming Tan, Tsung-Yang Liow, Guo-Qiang Lo, Samudra, G.S., Dong Zhi Chi, Yee-Chia Yeo
Published in IEEE electron device letters (01.02.2007)
Published in IEEE electron device letters (01.02.2007)
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Journal Article
P-Channel Tri-Gate FinFETs Featuring Ni1-yPtySiGe Source/Drain Contacts for Enhanced Drive Current Performance
LEE, Rinus Tek-Po, TAN, Kian-Ming, LIM, Andy Eu-Jin, LIOW, Tsung-Yang, SAMUDRA, Ganesh S, CHI, Dong-Zhi, YEO, Yee-Chia
Published in IEEE electron device letters (01.05.2008)
Published in IEEE electron device letters (01.05.2008)
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Journal Article
Prospect of large scale 2D transition metal dichalcogenides nanophotonics for optical communications
Zhi-Peng Ling, Rui Yang, Jian-Wei Chai, Shi-Jie Wang, Yu Tong, Qian Zhou, Xiao Gong, Dong-Zhi Chi, Kah-Wee Ang
Published in 2015 IEEE International Wireless Symposium (IWS 2015) (01.03.2015)
Published in 2015 IEEE International Wireless Symposium (IWS 2015) (01.03.2015)
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Conference Proceeding
Nickel-Aluminum Alloy Silicides with High Aluminum Content for Contact Resistance Reduction and Integration in n-Channel Field-Effect Transistors
Koh, Alvin Tian-Yi, Lee, Rinus Tek-Po, Lim, Andy Eu-Jin, Lai, Doreen Mei-Ying, Chi, Dong-Zhi, Hoe, Keat-Mun, Balasubramanian, N., Samudra, Ganesh S., Yeo, Yee-Chia
Published in Journal of the Electrochemical Society (2008)
Published in Journal of the Electrochemical Society (2008)
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Journal Article
Achieving Conduction Band-Edge Schottky Barrier Height for Arsenic-Segregated Nickel Aluminide Disilicide and Implementation in FinFETs With Ultra-Narrow Fin Widths
Rinus Tek-Po Lee, Tsung-Yang Liow, Kian-Ming Tan, Lim, A.E.-J., Koh, A.T.-Y., Ming Zhu, Guo-Qiang Lo, Samudra, G.S., Dong Zhi Chi, Yee-Chia Yeo
Published in IEEE electron device letters (01.04.2008)
Published in IEEE electron device letters (01.04.2008)
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Journal Article
P-Channel Tri-Gate FinFETs Featuring \hbox\hbox \hbox Source/Drain Contacts for Enhanced Drive Current Performance
Rinus Tek-Po Lee, Kian-Ming Tan, Lim, A.E.-J., Tsung-Yang Liow, Samudra, G.S., Dong-Zhi Chi, Yee-Chia Yeo
Published in IEEE electron device letters (01.05.2008)
Published in IEEE electron device letters (01.05.2008)
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Journal Article
The stability of aluminium oxide monolayer and its interface with two-dimensional materials
Song, Ting Ting, Yang, Ming, Chai, Jian Wei, Callsen, Martin, Zhou, Jun, Yang, Tong, Zhang, Zheng, Pan, Ji Sheng, Chi, Dong Zhi, Feng, Yuan Ping, Wang, Shi Jie
Published in Scientific reports (06.07.2016)
Published in Scientific reports (06.07.2016)
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Journal Article
Route to Low Parasitic Resistance in MuGFETs with Silicon-Carbon Source/Drain: Integration of Novel Low Barrier Ni(M)Si:C Metal Silicides and Pulsed Laser Annealing
Lee, R.T.-P., Koh, A.T.-Y., Fang-Yue Liu, Wei-Wei Fang, Tsung-Yang Liow, Kian-Ming Tan, Poh-Chong Lim, Lim, A.E.-J., Ming Zhu, Keat-Mun Hoe, Chin-Hang Tung, Guo-Qiang Lo, Xincai Wang, Low, D.K.-Y., Samudra, G.S., Dong-Zhi Chi, Yee-Chia Yeo
Published in 2007 IEEE International Electron Devices Meeting (01.12.2007)
Published in 2007 IEEE International Electron Devices Meeting (01.12.2007)
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Conference Proceeding