Electrical and physical characteristics of high-k gated MOSFETs with in-situ H sub(2)O and O sub(2) plasma formed interfacial layer
Lia, Yan-Lin, Chang-Liaoa, Kuei-Shu, Lia, Chen-Chien, Chena, Li-Ting, Sua, Tzu-Hsiang, Changa, Yu-Wei, Chena, Ting-Chun, Tsaia, Chia-Chi, Kaoa, Chia-Hung, Fenga, Hao-Ting, Leea, Yao-Jen
Published in Microelectronic engineering (01.11.2015)
Published in Microelectronic engineering (01.11.2015)
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