A floating well method for exact capacitance-voltage measurement of nano technology
Hung-Der Su, Bi-Shiou Chiou, Shien-Yang Wu, Ming-Hsung Chang, Kuo-Hua Lee, Yung-Shun Chen, Chih-Ping Chao, Yee-Chaung See, Sun, J.Y.-C.
Published in IEEE transactions on electron devices (01.06.2003)
Published in IEEE transactions on electron devices (01.06.2003)
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Journal Article
Characteristics of Oxide Breakdown and Related Impact on Device of Ultrathin (2.2 nm) Silicon Dioxide
Su, Hung-Der, Chiou, Bi-Shiou, Wu, Shien-Yang, Chang, Ming-Hsung, Lee, Kuo-Hua, Chen, Yung-Shun, Chao, Chih-Ping, See, Yee-Chaung, Sun, Jack Yuan-Chen
Published in Japanese Journal of Applied Physics (2003)
Published in Japanese Journal of Applied Physics (2003)
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Journal Article
Bi-Mode Breakdown Test Methodology of Ultrathin Oxide
Su, Hung-Der, Chiou, Bi-Shiou, Ko, Chin-Yuan, Wu, Shien-Yang, Chang, Ming-Hsung, Lee, Kuo-Hua, Chen, Yung-Shun, Chao, Chih-Ping, See, Yee-Chaung, Sun, Jack Yuan-Chen
Published in Japanese Journal of Applied Physics (2003)
Published in Japanese Journal of Applied Physics (2003)
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Journal Article
Current Mirrors with Tapered Stacked-Gates for Area Saving or Noise Improvement in 3nm FinFET Process
Hsia, Chu-En, Chang, Chin-Ho, Chen, Yung-Shun, Lai, Po-Yu, Jen, Ching Lin, Peng, Yung-Chow, Li, Shenggao
Published in 2024 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits) (16.06.2024)
Published in 2024 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits) (16.06.2024)
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