Stress Memorization Technique (SMT) Optimization for 45nm CMOS
Ortolland, C., Morin, P., Chaton, C., Mastromatteo, E., Populaire, C., Orain, S., Leverd, F., Stolk, P., Boeuf, F., Arnaud, F.
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Published in 2006 Symposium on VLSI Technology, 2006. Digest of Technical Papers (2006)
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Integration of fluorine-doped silicon oxide in copper pilot line for 0.12-μm technology
REYNARD, J. P, VEROVE, C, SABOURET, E, MOTTE, P, DESCOUTS, B, CHATON, C, MICHAILOS, J, BARLA, K
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Moisture diffusion in plasma-enhanced chemical vapor deposition dielectrics characterized with three techniques under clean room conditions
Cartailler, Vivien, Imbert, Grégory, Rochat, Névine, Chaton, Catherine, Vo-Thanh, Du, Benoit, Daniel, Duchamp, Geneviève, Frémont, Hélène
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Gas release and transport capacity investment as instruments to foster competition in gas markets
Chaton, Corinne, Gasmi, Farid, Guillerminet, Marie-Laure, Oviedo, Juan-Daniel
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Published in Energy economics (01.09.2012)
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A conventional 45nm CMOS node low-cost platform for general purpose and low power applications
Boeuf, F., Arnaud, F., Basso, M.T., Sotta, D., Wacquant, F., Rosa, J., Bicais-Lepinay, N., Bernard, H., Bustos, J., Manakli, S., Gaillardin, M., Grant, J., Skotnicki, T., Tavel, B., Duriez, B., Bidaud, M., Gouraud, P., Chaton, C., Morin, P., Todeschini, J., Jurdit, M., Pain, L., De-Jonghe, V., El-Farhane, R., Jullian, S.
Published in IEDM Technical Digest. IEEE International Electron Devices Meeting, 2004 (2004)
Published in IEDM Technical Digest. IEEE International Electron Devices Meeting, 2004 (2004)
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Conference Proceeding
Mechanical and Electrical Analysis of Strained Liner Effect in 35 nm Fully Depleted Silicon-on-Insulator Devices with Ultra Thin Silicon Channels
Gallon, C., Fenouillet-Beranger, C., Denorme, S., Boeuf, F., Fiori, V., Loubet, N., Vandooren, A., Kormann, T., Broekaart, M., Gouraud, P., Leverd, F., Imbert, G., Chaton, C., Laviron, C., Gabette, L., Vigilant, F., Garnier, P., Bernard, H., Tarnowka, A., Pantel, R., Pionnier, F., Jullian, S., Cristoloveanu, S., Skotnicki, T.
Published in Japanese Journal of Applied Physics (01.04.2006)
Published in Japanese Journal of Applied Physics (01.04.2006)
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Managing annealing pattern effects in 45nm low power CMOS technology
Morin, P., Cacho, F., Beneyton, R., Dumont, B., Bidaud, M., Josse, E., Gallon, C., Ranica, R., Villaret, A., Bianchini, R., Devoivre, T., Serret, E., Binger, R., Barla, K., Haond, M., Colin, A., Bono, H., Chaton, C.
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Published in 2009 Proceedings of the European Solid State Device Research Conference (01.09.2009)
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Conference Proceeding
Mechanical and electrical analysis of a strained liner effect in 35nm FDSOI devices with ultra-thin silicon channels
C., Gallon, C., Fenouillet-Beranger, S., Denorme, F., Boeuf, V., Fiori, N., Loubet, T., Kormann, M., Broekaart, P., Gouraud, F., Leverd, G., Imbert, C., Chaton, C., Laviron, L., Gabette, F., Vigilanti, P., Garnier, H., Bernard, A., Tarnowka, A., Vandooren, R., Pantel, F., Pionnier, S., Jullian, S., Cr, Skotnicki, T.
Published in Japanese Journal of Applied Physics (2006)
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Published in Japanese Journal of Applied Physics (2006)
Journal Article
Mechanical and electrical analysis of strained liner effect in 35 nm fully depleted silicon-on-insulator devices with ultra thin silicon channels
Gallon, C., Fenouillet-Beranger, C., Denorme, S., Boeuf, F., Fiori, V., Loubet, N., Vandooren, A., Kormann, T., Broekaart, M., Gouraud, P., Leverd, F., Imbert, G., Chaton, C., Laviron, C., Gabette, L., Vigilant, F., Garnier, P., Bernard, H., Tarnowka, A., Pantel, R., Pionnier, F., Jullian, Sophie, Cristoloveanu, S., Skotnicki, T.
Published in Japanese Journal of Applied Physics (2006)
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Published in Japanese Journal of Applied Physics (2006)
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Process monitoring and surface characterization with in-line XPS metrology
Cabuil, N, Gouil, A Le, Doclot, O, Dickson, B, Lagha, A, Aminpur, M, Chaton, C, Royer, J-C
Published in Solid state technology (01.10.2007)
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Published in Solid state technology (01.10.2007)
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