The effect of ozone concentration during atomic layer deposition on the properties of ZrO2 films for capacitor applications
Song, Hyoseok, Jeon, Heeyoung, Shin, Changhee, Shin, Seokyoon, Jang, Woochool, Park, Joohyun, Chang, Jaewan, Choi, Jae Hyoung, Kim, Younsoo, Lim, HanJin, Seo, Hyungtak, Jeon, Hyeongtag
Published in Thin solid films (30.11.2016)
Published in Thin solid films (30.11.2016)
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Journal Article
MIT characteristic of VO2 thin film deposited by ALD using vanadium oxytriisopropoxide precursor and H2O reactant
Changhee Shin, Hyeongsu Choi, Hyunwoo Park, Chanwon Jung, Seokhwi Song, Hyeongtag Jeon, Youngjoon Kim, Jong-Woo Kim, Keunsik Kim, Youngtae Choi, Hyungtak Seo, Namgue Lee, Hyunwoo Yuk
Published in Journal of Ceramic Processing Research (01.10.2019)
Published in Journal of Ceramic Processing Research (01.10.2019)
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Journal Article
The annealing effect on work function variation of WNxCy films deposited by remote plasma atomic layer deposition
Kim, Hyunjung, Jang, Woochool, Shin, Changhee, Lee, Kunyoung, Lim, Heewoo, Kim, Manseok, Yuh, Junhan, Jeon, Hyeongtag
Published in Physica status solidi. A, Applications and materials science (01.07.2017)
Published in Physica status solidi. A, Applications and materials science (01.07.2017)
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Journal Article
The annealing effect on work function variation of WN x C y films deposited by remote plasma atomic layer deposition
Kim, Hyunjung, Jang, Woochool, Shin, Changhee, Lee, Kunyoung, Lim, Heewoo, Kim, Manseok, Yuh, Junhan, Jeon, Hyeongtag
Published in Physica status solidi. A, Applications and materials science (01.07.2017)
Published in Physica status solidi. A, Applications and materials science (01.07.2017)
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Journal Article
Resistive switching behaviors of Ti nano-layer embedded TaO x -based devices
Jeon, Heeyoung, Park, Jingyu, Jang, Woochool, Kim, Hyunjung, Lee, Kunyoung, Shin, Changhee, Lee, Jaemin, Jeon, Hyeongtag
Published in Current applied physics (01.02.2017)
Published in Current applied physics (01.02.2017)
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Journal Article
Resistive switching behaviors of Ti nano-layer embedded TaOx-based devices
Jeon, Heeyoung, Park, Jingyu, Jang, Woochool, Kim, Hyunjung, Lee, Kunyoung, Shin, Changhee, Lee, Jaemin, Jeon, Hyeongtag
Published in Current applied physics (01.02.2017)
Published in Current applied physics (01.02.2017)
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Journal Article
A novel three-dimensional dual control-gate with surrounding floating-gate (DC-SF) NAND flash cell
Aritome, Seiichi, Whang, SungJin, Lee, KiHong, Shin, DaeGyu, Kim, BeomYong, Kim, MinSoo, Bin, JinHo, Han, JiHye, Kim, SungJun, Lee, BoMi, Jung, YoungKyun, Cho, SungYoon, Shin, ChangHee, Yoo, HyunSeung, Choi, SangMoo, Hong, Kwon, Park, SungKi, Hong, SungJoo
Published in Solid-state electronics (01.01.2013)
Published in Solid-state electronics (01.01.2013)
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Journal Article
Novel 3-dimensional Dual Control-gate with Surrounding Floating-gate (DC-SF) NAND flash cell for 1Tb file storage application
SungJin Whang, KiHong Lee, DaeGyu Shin, BeomYong Kim, MinSoo Kim, JinHo Bin, JiHye Han, SungJun Kim, BoMi Lee, YoungKyun Jung, SungYoon Cho, ChangHee Shin, HyunSeung Yoo, SangMoo Choi, Kwon Hong, Aritome, Seiichi, SungKi Park, SungJoo Hong
Published in 2010 International Electron Devices Meeting (01.12.2010)
Published in 2010 International Electron Devices Meeting (01.12.2010)
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