Thermal stability of hafnium silicate dielectric films deposited by a dual source liquid injection MOCVD
CHALKER, Paul R, MARSHALL, Paul A, POTTER, Richard J, JOYCE, Timothy B, JONES, Anthony C, TAYLOR, Stephen, NOAKES, Timothy C. Q, BAILEY, P
Published in Journal of materials science. Materials in electronics (01.11.2004)
Published in Journal of materials science. Materials in electronics (01.11.2004)
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Conference Proceeding
Journal Article
Anomalous capacitance-voltage hysteresis in MOS devices with ZrO2 and HfO2 dielectrics
Qifeng Lu, Yanfei Qi, Ce Zhou Zhao, Chun Zhao, Taylor, Stephen, Chalker, Paul R.
Published in 2016 5th International Symposium on Next-Generation Electronics (ISNE) (01.05.2016)
Published in 2016 5th International Symposium on Next-Generation Electronics (ISNE) (01.05.2016)
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Conference Proceeding
Journal Article
Novel mononuclear zirconium and hafnium alkoxides; improved precursors for the MOCVD of ZrO2 and HfO2
WILLIAMS, Paul A, ROBERTS, John L, JONES, Anthony C, CHALKER, Paul R, BICKLEY, Jamie F, STEINER, Alexander, DAVIES, Hywel O, LEEDHAM, Timothy J
Published in Journal of materials chemistry (01.01.2002)
Published in Journal of materials chemistry (01.01.2002)
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Journal Article
Influence of Polymorphism on the Electronic Structure of Ga 2 O 3
Swallow, Jack E. N., Vorwerk, Christian, Mazzolini, Piero, Vogt, Patrick, Bierwagen, Oliver, Karg, Alexander, Eickhoff, Martin, Schörmann, Jörg, Wagner, Markus R., Roberts, Joseph W., Chalker, Paul R., Smiles, Matthew J., Murgatroyd, Philip, Razek, Sara A., Lebens-Higgins, Zachary W., Piper, Louis F. J., Jones, Leanne A. H., Thakur, Pardeep K., Lee, Tien-Lin, Varley, Joel B., Furthmüller, Jürgen, Draxl, Claudia, Veal, Tim D., Regoutz, Anna
Published in Chemistry of materials (13.10.2020)
Published in Chemistry of materials (13.10.2020)
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Journal Article
Influence of Polymorphism on the Electronic Structure of Ga2O3
Swallow, Jack N., Vorwerk, Christian, Mazzolini, Piero, Vogt, Patrick, Bierwagen, Oliver, Karg, Alexander, Eickhoff, Martin, Schörmann, Jörg, Wagner, Markus R., Roberts, Joseph W., Chalker, Paul R., Smiles, Matthew J., Murgatroyd, Philip, Razek, Sara A., Lebens-Higgins, Zachary W., Piper, Louis J., Jones, Leanne A. H., Thakur, Pardeep K., Lee, Tien-Lin, Varley, Joel B., Furthmüller, Jürgen, Draxl, Claudia, Veal, Tim D., Regoutz, Anna
Published in Chemistry of materials (02.09.2020)
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Published in Chemistry of materials (02.09.2020)
Journal Article
Capacitance-voltage characteristics measured through pulse technique on high-k dielectric MOS devices
Lu, Qifeng, Qi, Yanfei, Zhao, Ce Zhou, Zhao, Chun, Taylor, Stephen, Chalker, Paul R.
Published in Vacuum (01.06.2017)
Published in Vacuum (01.06.2017)
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Journal Article
Effect of surface treatment on electrical properties of GaN metal–insulator–semiconductor devices with Al 2 O 3 gate dielectric
Cai, Yutao, Liu, Wen, Cui, Miao, Sun, Ruize, Liang, Yung C., Wen, Huiqing, Yang, Li, Supardan, Siti N., Mitrovic, Ivona Z., Taylor, Stephen, Chalker, Paul R., Zhao, Cezhou
Published in Japanese Journal of Applied Physics (01.04.2020)
Published in Japanese Journal of Applied Physics (01.04.2020)
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Journal Article
Total Dose Effects and Bias Instabilities of (NH 4 ) 2 S Passivated Ge MOS Capacitors With Hf x Zr 1– x O y Thin Films
Mu, Yifei, Fang, Yuxiao, Zhao, Ce Zhou, Zhao, Chun, Lu, Qifeng, Qi, Yanfei, Yi, Ruowei, Yang, Li, Mitrovic, Ivona Z., Taylor, Stephen, Chalker, Paul R.
Published in IEEE transactions on nuclear science (01.12.2017)
Published in IEEE transactions on nuclear science (01.12.2017)
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Journal Article
Band Line-up Investigation of Atomic Layer Deposited TiAlO and GaAlO on GaN
Das, Partha, Jones, Leanne A. H., Gibbon, James T., Dhanak, Vinod R., Partida-Manzanera, Teresa, Roberts, Joseph W., Potter, Richard, Chalker, Paul R., Cho, Sung-Jin, Thayne, Iain G., Mahapatra, Rajat, Mitrovic, Ivona Z.
Published in ECS journal of solid state science and technology (22.07.2020)
Published in ECS journal of solid state science and technology (22.07.2020)
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Journal Article
(Invited) Band Line-up of High-k Oxides on GaN
Mitrovic, Ivona Z., Das, Partha, Jones, Leanne, Gibbon, James, Dhanak, Vinod R., Mahapatra, Rajat, Partida Manzanera, Teresa, Roberts, Joseph W., Potter, Richard J, Chalker, Paul R., Cho, Sung-Jin, Thayne, Iain G
Published in ECS transactions (24.04.2020)
Published in ECS transactions (24.04.2020)
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Journal Article
Total Dose Effects and Bias Instabilities of (NH4)2S Passivated Ge MOS Capacitors With Hf x Zr1– x O y Thin Films
Mu, Yifei, Fang, Yuxiao, Ce Zhou Zhao, Zhao, Chun, Lu, Qifeng, Qi, Yanfei, Ruowei Yi, Yang, Li, Mitrovic, Ivona Z, Taylor, Stephen, Chalker, Paul R
Published in IEEE transactions on nuclear science (01.01.2017)
Published in IEEE transactions on nuclear science (01.01.2017)
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Journal Article
Total Dose Effects and Bias Instabilities of (NH4)2S Passivated Ge MOS Capacitors With HfxZr1-xOy Thin Films
Yifei Mu, Yuxiao Fang, Ce Zhou Zhao, Chun Zhao, Qifeng Lu, Yanfei Qi, Ruowei Yi, Li Yang, Mitrovic, Ivona Z., Taylor, Stephen, Chalker, Paul R.
Published in IEEE transactions on nuclear science (01.12.2017)
Published in IEEE transactions on nuclear science (01.12.2017)
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Journal Article
Synthesis and characterisation of four new heterometal alkoxides: potential precursors for the MOCVD of ferroelectric oxides
JONES, Anthony C, TOBIN, Neil L, MARSHALL, Paul A, POTTER, Richard J, CHALKER, Paul R, BICKLEY, Jamie F, DAVIES, Hywel O, SMITH, Lesley M, CRITCHLOW, Gary W
Published in Journal of materials chemistry (2004)
Published in Journal of materials chemistry (2004)
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Journal Article
Heteroleptic titanium alkoxides as single-source precursors for MOCVD of micro-structured TiO2
Ashraf, Sobia, Aspinall, Helen C., Bacsa, John, Chalker, Paul R., Davies, Hywel O., Jones, Anthony C., O’Brien, Paul, Wrench, Jacqueline S.
Published in Polyhedron (08.01.2015)
Published in Polyhedron (08.01.2015)
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Journal Article
Electrical Properties and Interfacial Studies of Hf x Ti 1- x O₂ High Permittivity Gate Insulators Deposited on Germanium Substrates
Lu, Qifeng, Mu, Yifei, Roberts, Joseph W, Althobaiti, Mohammed, Dhanak, Vinod R, Wu, Jingjin, Zhao, Chun, Zhao, Ce Zhou, Zhang, Qian, Yang, Li, Mitrovic, Ivona Z, Taylor, Stephen, Chalker, Paul R
Published in Materials (02.12.2015)
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Published in Materials (02.12.2015)
Journal Article
(Invited) Tunnel-Barrier Rectifiers for Optical Nantennas
Mitrovic, Ivona Z., Weerakkody, Ayendra Don, Sedghi, Naser, Hall, Stephen, Ralph, Jason F., Wrench, Jacqueline S., Chalker, Paul R., Luo, Zhenhua, Beeby, Steve
Published in ECS transactions (26.04.2016)
Published in ECS transactions (26.04.2016)
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Journal Article
Ce(IV) Complexes with Donor-Functionalized Alkoxide Ligands: Improved Precursors for Chemical Vapor Deposition of CeO 2
Aspinall, Helen C., Bacsa, John, Jones, Anthony C., Wrench, Jacqueline S., Black, Kate, Chalker, Paul R., King, Peter J., Marshall, Paul, Werner, Matthew, Davies, Hywel O., Odedra, Rajesh
Published in Inorganic chemistry (21.11.2011)
Published in Inorganic chemistry (21.11.2011)
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Journal Article
Erratum to “MOCVD of ZnO thin films for potential use as compliant layers for GaN on Si” [J. Cryst. Growth 310 (2008) 1010–1014]
Black, Kate, Jones, Antony C., Chalker, Paul R., Gaskell, Jeffrey M., Murrey, Robert T., Joyce, Tim B., Rushworth, Simon A.
Published in Journal of crystal growth (01.12.2009)
Published in Journal of crystal growth (01.12.2009)
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Journal Article
(Invited) Interface Engineering Routes for a Future CMOS Ge-Based Technology
Mitrovic, Ivona Z., Althobaiti, Mohammed, Weerakkody, Ayendra Don, Sedghi, Naser, Hall, Stephen, Dhanak, Vinod R., Mather, Sean, Chalker, Paul R., Tsoutsou, Dimitra, Dimoulas, Athanasios, Henkel, Christoph, Litta, Eugenio Dentoni, Hellström, Per-Erik, Östling, Mikael
Published in ECS transactions (01.01.2014)
Published in ECS transactions (01.01.2014)
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Journal Article