Electrical insulation properties of the perfluoronitrile C4F7N
Chachereau, A, Hösl, A, Franck, C M
Published in Journal of physics. D, Applied physics (16.10.2018)
Published in Journal of physics. D, Applied physics (16.10.2018)
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Journal Article
Electrical insulation properties of the perfluoroketone C5F10O
Chachereau, A, Hösl, A, Franck, C M
Published in Journal of physics. D, Applied physics (26.07.2018)
Published in Journal of physics. D, Applied physics (26.07.2018)
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Journal Article
Electron attachment to hexafluoropropylene oxide (HFPO)
Zawadzki, M, Chachereau, A, Kočišek, J, Franck, C M, Fedor, J
Published in The Journal of chemical physics (28.11.2018)
Published in The Journal of chemical physics (28.11.2018)
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Journal Article
Electron attachment properties of c-C4F8O in different environments
Chachereau, A, Fedor, J, Jane ková, R, Ko išek, J, Rabie, M, Franck, C M
Published in Journal of physics. D, Applied physics (18.08.2016)
Published in Journal of physics. D, Applied physics (18.08.2016)
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Journal Article
Obtaining electron attachment cross sections by means of linear inversion of swarm parameters
Rabie, M, Haefliger, P, Chachereau, A, Franck, C M
Published in Journal of physics. D, Applied physics (25.02.2015)
Published in Journal of physics. D, Applied physics (25.02.2015)
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Journal Article
Electrical insulation properties of the perfluoronitrile C 4 F 7 N
Chachereau, A, Hösl, A, Franck, C M
Published in Journal of physics. D, Applied physics (12.12.2018)
Published in Journal of physics. D, Applied physics (12.12.2018)
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Journal Article
Electrical insulation properties of the perfluoroketone C 5 F 10 O
Chachereau, A, Hösl, A, Franck, C M
Published in Journal of physics. D, Applied physics (22.08.2018)
Published in Journal of physics. D, Applied physics (22.08.2018)
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Journal Article
LXCat: an Open‐Access, Web‐Based Platform for Data Needed for Modeling Low Temperature Plasmas
Pitchford, Leanne C., Alves, Luis L., Bartschat, Klaus, Biagi, Stephen F., Bordage, Marie‐Claude, Bray, Igor, Brion, Chris E., Brunger, Michael J., Campbell, Laurence, Chachereau, Alise, Chaudhury, Bhaskar, Christophorou, Loucas G., Carbone, Emile, Dyatko, Nikolay A., Franck, Christian M., Fursa, Dmitry V., Gangwar, Reetesh K., Guerra, Vasco, Haefliger, Pascal, Hagelaar, Gerjan J. M., Hoesl, Andreas, Itikawa, Yukikazu, Kochetov, Igor V., McEachran, Robert P., Morgan, W. Lowell, Napartovich, Anatoly P., Puech, Vincent, Rabie, Mohamed, Sharma, Lalita, Srivastava, Rajesh, Stauffer, Allan D., Tennyson, Jonathan, de Urquijo, Jaime, van Dijk, Jan, Viehland, Larry A., Zammit, Mark C., Zatsarinny, Oleg, Pancheshnyi, Sergey
Published in Plasma processes and polymers (01.01.2017)
Published in Plasma processes and polymers (01.01.2017)
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Electron attachment properties of c-C 4 F 8 O in different environments
Chachereau, A, Fedor, J, Janečková, R, Kočišek, J, Rabie, M, Franck, C M
Published in Journal of physics. D, Applied physics (21.09.2016)
Published in Journal of physics. D, Applied physics (21.09.2016)
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