Ion-beam direct-structuring of high-temperature superconductors
Lang, W., Dineva, M., Marksteiner, M., Enzenhofer, T., Siraj, K., Peruzzi, M., Pedarnig, J.D., Bäuerle, D., Korntner, R., Cekan, E., Platzgummer, E., Loeschner, H.
Published in Microelectronic engineering (01.04.2006)
Published in Microelectronic engineering (01.04.2006)
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Conference Proceeding
Ion projection lithography below 70 nm: tool performance and resist process
Hirscher, S., Kümmel, M., Kirch, O., Domke, W.-D., Wolter, A., Käsmaier, R., Buschbeck, H., Cekan, E., Chalupka, A., Chylik, A., Eder, S., Horner, C., Löschner, H., Nowak, R., Stengl, G., Windischbauer, T., Zeininger, M.
Published in Microelectronic engineering (01.07.2002)
Published in Microelectronic engineering (01.07.2002)
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Resist process development for sub-100-nm ion projection lithography
Hirscher, S, Kaesmaier, R, Domke, W.-D, Wolter, A, Löschner, H, Cekan, E, Horner, C, Zeininger, M, Ochsenhirt, J
Published in Microelectronic engineering (01.09.2001)
Published in Microelectronic engineering (01.09.2001)
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Effects of 5-fluorouracil on cell cycle arrest and toxicity induced by X-irradiation in normal mammalian cells
Nylén, U., Cekan, E., Jonasson, G.-B., Lewin, F., Skog, S.
Published in Cell proliferation (01.04.2001)
Published in Cell proliferation (01.04.2001)
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Comparison of experimental and Monte Carlo results of stochastic Coulomb interaction in projection beam lithography
de Jager, P.W.H., Mertens, B., Munro, E., Cekan, E., Lammer, G., Vonach, H., Buschbeck, H., Zeininger, M., Horner, C., Löschner, H., Stengl, G., Bleeker, A.J.
Published in Microelectronic engineering (01.06.2000)
Published in Microelectronic engineering (01.06.2000)
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DUV resist UV II HS applied to high resolution electron beam lithography and to masked ion beam proximity and reduction printing
Bruenger, W.H., Buschbeck, H., Cekan, E., Eder, S., Fedynyshyn, T.H., Hertlein, W.G., Hudek, P., Kostic, I., Loeschner, H., Rangelow, I.W., Torkler, M.
Published in Microelectronic engineering (01.03.1998)
Published in Microelectronic engineering (01.03.1998)
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Silicon stencil masks for masked ion beam lithography proximity printing
Rangelow, I.W., Shi, F., Hudek, P., Kostic, I., Hammel, E., Löschner, H., Stengl, G., Cekan, E.
Published in Microelectronic engineering (01.01.1996)
Published in Microelectronic engineering (01.01.1996)
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Masked ion beam lithography for proximity printing
Hammel, E., Löschner, H., Stengl, G., Buschbeck, H., Chalupka, A., Vonach, H., Cekan, E., Fallmann, W., Paschke, F., Stangl, G.
Published in Microelectronic engineering (01.01.1996)
Published in Microelectronic engineering (01.01.1996)
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Newly developed novolak-based resist materials for ion projection lithography (IPL) with structure dimensions of 200-100 nanometers
Stangl, G., Cekan, E., Eckes, Ch, Friza, W., Thalinger, F., Bruckner, A., Hudek, P., Fallmann, W.
Published in Microelectronic engineering (01.04.1993)
Published in Microelectronic engineering (01.04.1993)
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Lithography with high depth of focus by an ion projection system
Buchmann, L.-M., Schnakenberg, U., Torkler, M., Loschner, H., Stengl, G., traher, C., Fallmann, W., Stangl, G., Cekan, E.
Published in Journal of microelectromechanical systems (01.09.1992)
Published in Journal of microelectromechanical systems (01.09.1992)
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Effects of dietary sodium selenite supplementation on salicylate-induced embryo- and fetotoxicity in the rat
Bergman, K, Cekan, E, Slanina, P, Gabrielsson, J, Hellenäs, K E
Published in Toxicology (Amsterdam) (17.04.1990)
Published in Toxicology (Amsterdam) (17.04.1990)
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Resist materials for sub-0.5-μm pattern transfer with demagnifying ion projection lithography (IPL)
Stangl, G., Cekan, E., Jacob, S., Fallmann, W., Paschke, F., Buchmann, L.M., Müller, K.P., Csepregi, L., Heuberger, A., Hammel, E., Traher, C., Löschner, H., Stengl, G.
Published in Microelectronic engineering (1989)
Published in Microelectronic engineering (1989)
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Lithography with high depth of focus by an ion projection system
Buchmann, L.-M., Schnakenberg, U., Torkler, M., Loschner, H., Stengl, G., Traher, C., Fallmann, W., Stangl, G., Cekan, E.
Published in IEEE Micro Electro Mechanical Systems, 1992 (1992)
Published in IEEE Micro Electro Mechanical Systems, 1992 (1992)
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Ion-beam modification of high-temperature superconductor thin films for the fabrication of superconductive nanodevices
Lang, W., Marksteiner, M., Dineva, M., Enzenhofer, T., Siraj, K., Peruzzi, M., Pedarnig, J.D., Bauerle, D., Korntner, R., Cekan, E., Platzgummer, E., Loeschner, H.
Published in 2006 IEEE Conference on Emerging Technologies - Nanoelectronics (2006)
Published in 2006 IEEE Conference on Emerging Technologies - Nanoelectronics (2006)
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Conference Proceeding
P13/05: Toxicology of the false morel (Gyromitra esculenta): determination, pharmacokinetics and embryotoxicity of monomethylhydrazine
Slanina, P, Cekan, E, Bergman, K, Gabrielsson, J, Halen, B, Samuelsson, R
Published in Pharmacology & toxicology. Supplement (1993)
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Published in Pharmacology & toxicology. Supplement (1993)
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