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50 nm 이하의 라인 간격 치수를 갖는 패턴화 재료를 처리할 때 패턴 붕괴를 피하기 위한 암모니아 활성화된 실록산을 포함하는 조성물
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Nanocomposites by the use of simultaneous twin polymerization: tin alloys in a carbon/silica matrixElectronic supplementary information (ESI) available. See DOI: 10.1039/c5ra18574b
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