HIGHLY SENSITIVE DRY DEVELOPABLE DEEP UV PHOTORESIST
MONTGOMERY, MELVIN WARREN, CROCKATT, DALE MURRAY, MOREAU, WAYNE MARTIN, CONLEY, WILLARD EARL, JR, BRUNSVOLD, WILLIAM ROSS, CHIU, PHILIP
Year of Publication 08.01.1992
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Year of Publication 08.01.1992
Patent
Highly sensitive dry developable deep UV photoresist
MONTGOMERY, MELVIN WARREN, CROCKATT, DALE MURRAY, MOREAU, WAYNE MARTIN, CONLEY, WILLARD EARL, JR, BRUNSVOLD, WILLIAM ROSS, CHIU, PHILIP
Year of Publication 02.05.1991
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Year of Publication 02.05.1991
Patent
Lithographic method employing thermally stable photoresists with high sensitivity forming a hydogen-bonded network
CHOW, MING-FEA, ITO, HIROSHI, IWAMOTO, NANCY ELLEN, CROCKATT, DALE MURRAY, CONLEY, WILLARD EARL, HEFFERSON, GEORGE JOSEPH, WILLSON, CARLTON GRANT, FRECHET, JEAN-MARIE JOSEPH, BRUNSVOLD, WILLIAM ROSS
Year of Publication 04.01.1995
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Year of Publication 04.01.1995
Patent
THERMALLY STABLE PHOTORESISTS WITH HIGH SENSITIVITY BACKGROUND OF THE INVENTION
CHOW, MING-FEA, ITO, HIROSHI, IWAMOTO, NANCY ELLEN, CROCKATT, DALE MURRAY, CONLEY, WILLARD EARL, HEFFERSON, GEORGE JOSEPH, WILLSON, CARLTON GRANT, FRECHET, JEAN-MARIE JOSEPH, BRUNSVOLD, WILLIAM ROSS
Year of Publication 25.10.1989
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Year of Publication 25.10.1989
Patent
Thermally stable photoresists with high sensitivity background of the invention
CHOW, MING-FEA, ITO, HIROSHI, IWAMOTO, NANCY ELLEN, CROCKATT, DALE MURRAY, CONLEY, WILLARD EARL, HEFFERSON, GEORGE JOSEPH, WILLSON, CARLTON GRANT, FRECHET, JEAN-MARIE JOSEPH, BRUNSVOLD, WILLIAM ROSS
Year of Publication 03.02.1988
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Year of Publication 03.02.1988
Patent
METODO LITOGRAFICO QUE EMPLEA FOTO-RESERVAS TERMICAMENTE ESTABLES DE ALTA SENSIBILIDAD QUE FORMAN UN RETICULO CON ENLACES DE HIDROGENO
CHOW, MING-FEA, ITO, HIROSHI, IWAMOTO, NANCY ELLEN, CROCKATT, DALE MURRAY, CONLEY, WILLARD EARL, HEFFERSON, GEORGE JOSEPH, WILLSON, CARLTON GRANT, FRECHET, JEAN-MARIE JOSEPH, BRUNSVOLD, WILLIAM ROSS
Year of Publication 01.03.1995
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Year of Publication 01.03.1995
Patent
Hochempfindliche Resiste mit Selbstzersetzungstemperatur grösser als etwa 160 Grad Celsius
CONLEY, WILLARD EARL, CORNWALL NEW YORK 12518, US, BRUNSVOLD, WILLIAM ROSS, POUGHKEEPSIE NEW YORK 12603, US, IWAMOTO, NANCY ELLEN, PORTLAND, OR 97225, US, CROCKATT, DALE MURRAY, SOMERS NEW YORK 10589, US
Year of Publication 26.09.1996
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Year of Publication 26.09.1996
Patent
Lithographische Methode unter Benutzung hochempfindlicher, wärmebeständiger Photolacke, die ein Netz von Wasserstoffbrücken bilden
HEFFERSON, GEORGE JOSEPH, FISHKILL NY 12524, US, CROCKATT, DALE MURRAY, SOMERS NY 10589, US, FRECHET, JEAN-MARIE JOSEPH, OTTAWA ONTARIO K1V 6Y7, CA, IWAMOTO, NANCY ELLEN, OREGON 97225, US, BRUNSVOLD, WILLIAM ROSS, POUGHKEEPSIE NY 12603, US, CHOW, MING-FEA, POUGHQUAQ NY 12570, US, ITO, HIROSHI, CA 95139, US, WILLSON, CARLTON GRANT, CA 95126, US, CONLEY, WILLARD EARL, CORNWALL NY 12518, US
Year of Publication 13.07.1995
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Year of Publication 13.07.1995
Patent