Search Results - "COTLER-WAGNER TINA J" :: K.UTB vyhledávací portál

Method for etching a silicon dioxide layer with a fluorocarbon plasma

by DELLAGUARDIA, RONALD A, WILLE, WILLIAM C, ARMACOST, MICHAEL D, DOBUZINSKY, DAVID M, PASSOW, MICHAEL L, CONLEY, WILLARD E, COTLER-WAGNER, TINA J
Year of Publication 04.02.2004

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Resist formulation which minimizes blistering during etching

by DOBUZINSKY DAVID M, PASSOW MICHAEL L, WILLE WILLIAM C, COTLER-WAGNER TINA J, DELLAGUARDIA RONALD A, ARMACOST MICHAEL D, CONLEY WILLARD E
Year of Publication 27.03.2001

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METHOD OF ETCHING SILICON OXIDE SILICON LAYER

by DOBUZINSKY DAVID M, PASSOW MICHAEL L, WILLE WILLIAM C, COTLER-WAGNER TINA J, DELLAGUARDIA RONALD A, ARMACOST MICHAEL D, CONLEY WILLARD E
Year of Publication 09.07.1999

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Method for etching a silicon dioxide layer with a fluorocarbon plasma

by DELLAGUARDIA, RONALD A, WILLE, WILLIAM C, ARMACOST, MICHAEL D, DOBUZINSKY, DAVID M, PASSOW, MICHAEL L, CONLEY, WILLARD E, COTLER-WAGNER, TINA J
Year of Publication 16.06.1999

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Patent

Method for etching a silicon dioxide layer with a fluorocarbon plasma

Resist formulation which minimizes blistering during etching

METHOD OF ETCHING SILICON OXIDE SILICON LAYER

Method for etching a silicon dioxide layer with a fluorocarbon plasma

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