Search Results - "CORY WAJDA" :: K.UTB vyhledávací portál | TBU Library Retrieval Portal

Demonstration of transfer learning using 14 nm technology analog ReRAM array

Demonstration of transfer learning using 14 nm technology analog ReRAM array

by Athena, Fabia Farlin, Fagbohungbe, Omobayode, Gong, Nanbo, Rasch, Malte J., Penaloza, Jimmy, Seo, SoonCheon, Gasasira, Arthur, Solomon, Paul, Bragaglia, Valeria, Consiglio, Steven, Higuchi, Hisashi, Park, Chanro, Brew, Kevin, Jamison, Paul, Catano, Christopher, Saraf, Iqbal, Silvestre, Claire, Liu, Xuefeng, Khan, Babar, Jain, Nikhil, McDermott, Steven, Johnson, Rick, Estrada-Raygoza, I., Li, Juntao, Gokmen, Tayfun, Li, Ning, Pujari, Ruturaj, Carta, Fabio, Miyazoe, Hiroyuki, Frank, Martin M., La Porta, Antonio, Koty, Devi, Yang, Qingyun, Clark, Robert D., Tapily, Kandabara, Wajda, Cory, Mosden, Aelan, Shearer, Jeff, Metz, Andrew, Teehan, Sean, Saulnier, Nicole, Offrein, Bert, Tsunomura, Takaaki, Leusink, Gert, Narayanan, Vijay, Ando, Takashi
Published in Frontiers in electronics (Online) (15.01.2024)

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Journal Article

Bilayer Dielectrics for RRAM Devices

Bilayer Dielectrics for RRAM Devices

by Misra, Durgamadhab, Sultana, Sabiha, Jain, Barsha, Bhat, Navakanta, Tapily, Kandabara, Clark, Robert D., Consiglio, Steven, Wajda, Cory S., Leusink, Gert J.
Published in ECS transactions (01.01.2018)

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Journal Article

High-K Gate Dielectric Structures by Atomic Layer Deposition for the 32nm and Beyond Nodes

High-K Gate Dielectric Structures by Atomic Layer Deposition for the 32nm and Beyond Nodes

by Clark, Robert D., Consiglio, Steve, Wajda, Cory, Leusink, Gert, Sugawara, Takuya, Nakabayashi, Hajime, Jagannathan, Hemanth, Edge, Lisa F., Jamison, Paul, Paruchuri, Vamsi, Iijima, Ryosuke, Takayanagi, Mariko, Linder, Barry, Bruley, J, Copel, Matt, Narayanan, Vijay
Published in ECS transactions (03.10.2008)

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Journal Article

RRAM Devices with Plasma Treated HfO2 with Ru as Top Electrode for In-Memory Computing Hardware

RRAM Devices with Plasma Treated HfO2 with Ru as Top Electrode for In-Memory Computing Hardware

by Patel, Yuvraj, Misra, Durga, Triyoso, Dina H., Tapily, Kandabara, Clark, Robert D, Consiglio, Steven, Pattanaik, Gyana, Cole, Christopher, Raley, Angelique, Wajda, Cory S, Leusink, Gert J
Published in ECS transactions (01.10.2021)

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Journal Article

RRAM Devices with Plasma Treated HfO 2 with Ru as Top Electrode for In-Memory Computing Hardware

RRAM Devices with Plasma Treated HfO 2 with Ru as Top Electrode for In-Memory Computing Hardware

by Patel, Yuvraj, Misra, Durga, Triyoso, Dina H., Tapily, Kandabara, Clark, Robert D, Consiglio, Steven, Pattanaik, Gyana, Cole, Christopher, Raley, Angelique, Wajda, Cory S, Leusink, Gert J
Published in ECS transactions (01.10.2021)

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Journal Article

Process Dependent Optimization of Dielectric and Metal Stacks for Multilevel Resistive Random-Access Memory

Process Dependent Optimization of Dielectric and Metal Stacks for Multilevel Resistive Random-Access Memory

by Zhao, Pengxiang, Misra, Durga, Triyoso, Dina, Kaushik, Vidya, Tapily, Kandabara, Clark, Robert D., Consiglio, Steven, Wajda, Cory S., Leusink, Gert J.
Published in ECS transactions (24.04.2020)

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Journal Article

Multilevel Resistive Switching in Hf-Based RRAM

Multilevel Resistive Switching in Hf-Based RRAM

by Jain, Barsha, Huang, Chia-sheng, Misra, Durgamadhab, Tapily, Kandabara, Clark, Robert D., Consiglio, Steven, Wajda, Cory S., Leusink, Gert J.
Published in ECS transactions (23.04.2019)

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Journal Article

Process-Induced ReRAM Performance Improvement of Atomic Layer Deposited HfO 2 for Analog In-Memory Computing Applications

Process-Induced ReRAM Performance Improvement of Atomic Layer Deposited HfO 2 for Analog In-Memory Computing Applications

by Consiglio, Steven, Higuchi, Hisashi, Ando, Takashi, Jamison, Paul, Seo, Soon-Cheon, Kong, Dexin, Kim, Youngseok, Tapily, Kandabara, Clark, Robert D, Hopstaken, Marinus, Cartier, Eduard, Tsunomura, Takaaki, Wajda, Cory S, Soave, Robert, Narayanan, Vijay, Leusink, Gert J
Published in ECS transactions (07.05.2021)

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Journal Article

Process-Induced ReRAM Performance Improvement of Atomic Layer Deposited HfO2 for Analog In-Memory Computing Applications

Process-Induced ReRAM Performance Improvement of Atomic Layer Deposited HfO2 for Analog In-Memory Computing Applications

by Consiglio, Steven, Higuchi, Hisashi, Ando, Takashi, Jamison, Paul, Seo, Soon-Cheon, Kong, Dexin, Kim, Youngseok, Tapily, Kandabara, Clark, Robert D, Hopstaken, Marinus, Cartier, Eduard, Tsunomura, Takaaki, Wajda, Cory S, Soave, Robert, Narayanan, Vijay, Leusink, Gert J
Published in ECS transactions (07.05.2021)

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Journal Article

The Effect of Defects on Time Dependent Dielectric Breakdown Acceleration in TiN/ZrO 2 /Al 2 O 3 /p-Ge Gate Stacks

The Effect of Defects on Time Dependent Dielectric Breakdown Acceleration in TiN/ZrO 2 /Al 2 O 3 /p-Ge Gate Stacks

by Ding, Yiming, Misra, Durgamadhab, Tapily, Kandabara, Clark, Robert D., Consiglio, Steven, Wajda, Cory S., Leusink, Gert J.
Published in ECS transactions (26.04.2017)

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Journal Article

Reliability of Post Plasma Oxidation Processed ALD Al 2 O 3 /Hf 1-x Zr x O 2 Thin Films on Ge Substrates

Reliability of Post Plasma Oxidation Processed ALD Al 2 O 3 /Hf 1-x Zr x O 2 Thin Films on Ge Substrates

by Bhuyian, Md Nasir Uddin, Sengupta, Arijit, Ding, Yiming, Misra, Durga, Tapily, Kandabara, Clark, Robert D., Consiglio, Steven, Wajda, Cory S., Leusink, Gert J.
Published in ECS transactions (18.04.2017)

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Journal Article

Effect of Al Doping on the Reliability of ALD HfO 2

Effect of Al Doping on the Reliability of ALD HfO 2

by Bhuyian, Mdnasiruddin, Misra, Durga, Tapily, Kandabara, Clark, Robert, Consiglio, Steve, Wajda, Cory, Nakamura, G., Leusink, Gert
Published in ECS transactions (09.08.2014)

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Journal Article

Atomic Layer Deposition of Ultrathin TaN and Ternary Ta[subscript 1-X]Al[subscript X]N[subscript y] Films for Cu Diffusion Barrier Applications in Advanced Interconnects

Atomic Layer Deposition of Ultrathin TaN and Ternary Ta[subscript 1-X]Al[subscript X]N[subscript y] Films for Cu Diffusion Barrier Applications in Advanced Interconnects

by Consiglio, Steven, Yu, Kyle, Dey, Sonal, Tapily, Kandabara, Clark, Robert D., Hasegawa, Toshio, Wajda, Cory S., Leusink, Gert J., Diebold, Alain C.
Published in ECS transactions (08.07.2016)

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Journal Article

SELECTIVE METAL OXIDE DEPOSITION USING SELF-ASSEMBLED MONOLAYER SURFACE PRETREATMENT

SELECTIVE METAL OXIDE DEPOSITION USING SELF-ASSEMBLED MONOLAYER SURFACE PRETREATMENT

by KANG HO YONG, KANDABARA N TAPILY, CORY WAJDA, GERRIT J LEUSINK
Year of Publication 22.03.2018

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Patent

Cyclic Plasma Treatment during ALD Hf 1-X Zr x O 2 Deposition

Cyclic Plasma Treatment during ALD Hf 1-X Zr x O 2 Deposition

by Bhuyian, Mdnasiruddin, Misra, Durga, Tapily, Kandabara, Clark, Robert, Consiglio, Steve, Wajda, Cory, Nakamura, G., Leusink, Gert
Published in ECS transactions (24.03.2014)

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Journal Article

Electrically Scaled Hafnium Oxide Based Ge Devices

Electrically Scaled Hafnium Oxide Based Ge Devices

by Tapily, Kandabara, Dey, Sonal, Consiglio, Steven, Clark, Robert D., Wajda, Cory S., Leusink, Gert J., Diebold, Alain C.
Published in ECS transactions (19.08.2016)

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Journal Article

The Effect of Defects on Time Dependent Dielectric Breakdown Acceleration in TiN/ZrO2/Al2O3/p-Ge Gate Stacks

The Effect of Defects on Time Dependent Dielectric Breakdown Acceleration in TiN/ZrO2/Al2O3/p-Ge Gate Stacks

by Ding, Yiming, Misra, Durgamadhab, Tapily, Kandabara, Clark, Robert D., Consiglio, Steven, Wajda, Cory S., Leusink, Gert J.
Published in ECS transactions (01.01.2017)

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Journal Article

Effect of Post Plasma Oxidation on Ge Gate Stacks Interface Formation

Effect of Post Plasma Oxidation on Ge Gate Stacks Interface Formation

by Mukhopadhyay, Sromana, Mitra, Shilpa, Ding, YI Ming, Ganapathi, K.L., Misra, Durga, Bhat, Navakanta, Tapily, Kandabara, Clark, Robert D., Consiglio, Steven, Wajda, Cory S., Leusink, Gert J.
Published in ECS transactions (04.05.2016)

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Journal Article

Atomic Layer Deposition of Ultrathin TaN and Ternary Ta 1-X Al X N y Films for Cu Diffusion Barrier Applications in Advanced Interconnects

Atomic Layer Deposition of Ultrathin TaN and Ternary Ta 1-X Al X N y Films for Cu Diffusion Barrier Applications in Advanced Interconnects

by Consiglio, Steven, Yu, Kyle, Dey, Sonal, Tapily, Kandabara, Clark, Robert D., Hasegawa, Toshio, Wajda, Cory S., Leusink, Gert J., Diebold, Alain C.
Published in ECS transactions (10.09.2015)

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Journal Article

Higher-K Formation in Atomic Layer Deposited Hf 1-X Al x O y

Higher-K Formation in Atomic Layer Deposited Hf 1-X Al x O y

by Tapily, Kandabara, Consiglio, Steve, Clark, Robert, Vasic, Relja, Wajda, Cory, Jordan-Sweet, Jean, Leusink, Gert, Diebold, A.C
Published in ECS transactions (13.08.2014)

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Journal Article

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