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Conference Proceeding
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Year of Publication 04.07.2024
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Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same
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Year of Publication 19.03.2024
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Pitch Reduction Technology Using Alternating Spacer Depositions During the Formation of a Semiconductor Device and Systems Including Same
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Year of Publication 11.08.2022
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Year of Publication 11.08.2022
Patent
Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same
Niroomand, Ardavan, Morgan, Paul A, Meng, Shuang, Greeley, Joseph Neil, Zhou, Baosuo, Coppa, Brian J, Abatchev, Mirzafer K
Year of Publication 17.05.2022
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Year of Publication 17.05.2022
Patent