Novel Materials and Processes in Replacement Metal Gate for Advanced CMOS Technology
Bao, Ruqiang, Hung, Steven, Wang, Miaomiao, Chung, Kisup, Barman, Soumendra, Krishnan, Siddarth A, Yang, Yixiong, Tang, Wei, Li, Luping, Lin, Yongjing, Chan, Michael S, Chen, Zhebo, Miao, Xin, Hopstaken, Marinus, Conti, Richard A, Jagannathan, Hemanth, Chudzik, Michael P, McHerron, Dalea, Haran, Bala S, Natarajan, Sanjay
Published in 2018 IEEE International Electron Devices Meeting (IEDM) (01.12.2018)
Published in 2018 IEEE International Electron Devices Meeting (IEDM) (01.12.2018)
Get full text
Conference Proceeding
Gate-Cut-Last in RMG to Enable Gate Extension Scaling and Parasitic Capacitance Reduction
Greene, Andrew, Zhou, Huimei, Xie, Ruilong, Park, Chanro, Economikos, Laertis, Chan, Victor, Akarvardar, Kerem, Bao, Ruqiang, Seshadri, Indira, Conti, Richard, Wang, Miaomiao, Sankarapandian, Muthumanickam, Demarest, James, Li, Juntao, Jiang, Liying, Zhao, Kai, Robison, Robert, Ando, Takashi, Cave, Nigel, Knorr, Andreas, Gupta, Dinesh, Kanakasabapathy, Sivananda, Guo, Dechao, Haran, Bala, Basker, Veeraraghavan, Bu, Huiming
Published in 2019 Symposium on VLSI Technology (01.06.2019)
Published in 2019 Symposium on VLSI Technology (01.06.2019)
Get full text
Conference Proceeding
Nano multilayer carbon-rich low-k spacer
Nguyen, Son, Miller, Eric, Haigh, Jr., Thomas J, Conti, Richard A, Canaperi, Donald
Year of Publication 17.10.2023
Get full text
Year of Publication 17.10.2023
Patent
Highly Selective Dry Etch Process for Vertical FET STI Recess
Belyansky, Michael P, Bi, Zhenxing, Conti, Richard A, Sankarapandian, Muthumanickam
Year of Publication 23.04.2020
Get full text
Year of Publication 23.04.2020
Patent
STRESSED MATERIAL WITHIN GATE CUT REGION
LIE, FEE LI, ZHOU, HUIMEI, Belyansky, Michael P, LI, JUNTAO, Greene, Andrew M, Conti, Richard A, Robison, Robert, Gluschenkov, Oleg
Year of Publication 04.05.2023
Get full text
Year of Publication 04.05.2023
Patent