METHOD FOR A LITHOGRAPHIC APPARATUS
FINDERS JOZEF MARIA, DE WINTER LAURENTIUS CORNELIUS, COLINA SANTAMARIA LUIS ALBERTO
Year of Publication 24.06.2010
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Year of Publication 24.06.2010
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Methods for calibrating simulation process and related non-transitory computer-readable medium
TIMOSHKOV, VADIM YOURIEVICH, COLINA, LUIS ALBERTO COLINA SANTAMARIA, SLACHTER, ABRAHAM, DILLEN, HERMANUS ADRIANUS, KOOIMAN, MARLEEN, JIANG, AIQIN, RAGHUNATHAN, SUDHARSHANAN, VAN LARE, MARIE-CLAIRE, HUNSCHE, STEFAN, VAN INGEN SCHENAU, KOENRAAD, WANG, FU-MING
Year of Publication 01.04.2024
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Year of Publication 01.04.2024
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Methods for calibrating simulation process and related non-transitory computer-readable medium
TIMOSHKOV, VADIM YOURIEVICH, COLINA, LUIS ALBERTO COLINA SANTAMARIA, WANG, FUMING, SLACHTER, ABRAHAM, DILLEN, HERMANUS ADRIANUS, KOOIMAN, MARLEEN, JIANG, AIQIN, RAGHUNATHAN, SUDHARSHANAN, VAN LARE, MARIE-CLAIRE, HUNSCHE, STEFAN, VAN INGEN SCHENAU, KOENRAAD
Year of Publication 01.12.2023
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Year of Publication 01.12.2023
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Methods for adjusting a process window and related non-transitory computer-readable medium
TIMOSHKOV, VADIM YOURIEVICH, COLINA, LUIS ALBERTO COLINA SANTAMARIA, SLACHTER, ABRAHAM, DILLEN, HERMANUS ADRIANUS, KOOIMAN, MARLEEN, JIANG, AIQIN, RAGHUNATHAN, SUDHARSHANAN, VAN LARE, MARIE-CLAIRE, HUNSCHE, STEFAN, VAN INGEN SCHENAU, KOENRAAD, WANG, FU-MING
Year of Publication 16.02.2023
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Year of Publication 16.02.2023
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Methods for adjusting a process window and related non-transitory computer-readable medium
TIMOSHKOV, VADIM YOURIEVICH, COLINA, LUIS ALBERTO COLINA SANTAMARIA, WANG, FUMING, SLACHTER, ABRAHAM, DILLEN, HERMANUS ADRIANUS, KOOIMAN, MARLEEN, JIANG, AIQIN, RAGHUNATHAN, SUDHARSHANAN, VAN LARE, MARIE-CLAIRE, HUNSCHE, STEFAN, VAN INGEN SCHENAU, KOENRAAD
Year of Publication 01.12.2022
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Year of Publication 01.12.2022
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Method for calibrating simulation process based on defect-based process window
TIMOSHKOV, VADIM YOURIEVICH, COLINA, LUIS ALBERTO COLINA SANTAMARIA, SLACHTER, ABRAHAM, DILLEN, HERMANUS ADRIANUS, KOOIMAN, MARLEEN, JIANG, AIQIN, RAGHUNATHAN, SUDHARSHANAN, VAN LARE, MARIE-CLAIRE, HUNSCHE, STEFAN, VAN INGEN SCHENAU, KOENRAAD, WANG, FU-MING
Year of Publication 16.12.2021
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Year of Publication 16.12.2021
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MARKER STRUCTURE FOR ALIGNMENT OR OVERLAY FOR CORRECTING PATTERN INDUCED DISPLACEMENT, MASK PATTERN FOR DEFINING THE MARKER STRUCTURE, AND LITHOGRAPHIC PROJECTION DEVICE USING THIS MASK PATTERN
DUSA MIRCEA, COLINA LUIS ALBERTO COLINA SANTAMARIA, HENDRICKX ERIC HENRI JAN, FINDERS JOZEF MARIA, VAN HAREN RICHARD JOHANNES FRANCISCUS, VANDENBERGHE GEERT, VAN DER HOFF ALEXANDER HENDRIKUS MARTINUS
Year of Publication 07.01.2010
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Year of Publication 07.01.2010
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MARKER STRUCTURE, MASK PATTERN, ALIGNMENT METHOD, AND LITHOGRAPHIC METHOD AND APPARATUS
DUSA MIRCEA, COLINA LUIS ALBERTO COLINA SANTAMARIA, HENDRICKX ERIC HENRI JAN, FINDERS JOZEF MARIA, VAN HAREN RICHARD JOHANNES FRANCISCUS, VANDENBERGHE GEERT, VAN DER HOFF ALEXANDER HENDRIKUS MARTINUS
Year of Publication 19.03.2009
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Year of Publication 19.03.2009
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Marker structure, mask pattern, alignment method and lithographic method and apparatus
DUSA MIRCEA, COLINA LUIS ALBERTO COLINA SANTAMARIA, HENDRICKX ERIC HENRI JAN, FINDERS JOZEF MARIA, VAN HAREN RICHARD JOHANNES FRANCISCUS, VANDENBERGHE GEERT, VAN DER HOFF ALEXANDER HENDRIKUS MARTINUS
Year of Publication 16.12.2008
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Year of Publication 16.12.2008
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Marker structure, mask pattern, alignment method and lithographic method and apparatus
Finders, Jozef Maria, Dusa, Mircea, Van Haren, Richard Johannes Franciscus, Colina, Luis Alberto Colina Santamaria, Hendrickx, Eric Henri Jan, Vandenberghe, Geert, Van Der Hoff, Alexander Hendrikus Martinus
Year of Publication 16.12.2008
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Year of Publication 16.12.2008
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MARKER STRUCTURE FOR ALIGNMENT OR OVERLAY TO CORRECT PATTERN INDUCED DISPLACEMENT, MASK PATTERN FOR DEFINING SUCH A MARKER STRUCTURE AND LITHOGRAPHIC PROJECTION APPARATUS USING SUCH A MASK PATTERN
DUSA MIRCEA, COLINA LUIS ALBERTO COLINA SANTAMARIA, HENDRICKX ERIC HENRI JAN, FINDERS JOZEF MARIA, VAN HAREN RICHARD JOHANNES FRANCISCUS, VANDENBERGHE GEERT, VAN DER HOFF ALEXANDER HENDRIKUS MARTINUS
Year of Publication 26.10.2007
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Year of Publication 26.10.2007
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Marker structure for alignment or overlay to correct pattern induced displacement, mask pattern for defining such a marker structure and lithographic projection apparatus using such a mask pattern
HENDRICKX, ERIC HENRI JAN, DUSA, MIRCEA, COLINA, LUIS ALBERTO COLINA SANTAMARIA, FINDERS, JOZEF MARIA, VAN HAREN, RICHARD JOHANNES FRANCISCUS
Year of Publication 11.11.2005
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Year of Publication 11.11.2005
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Marker structure for alignment or overlay
HENDRICKX, ERIC HENRI JAN, DUSA, MIRCEA, COLINA, LUIS ALBERTO COLINA SANTAMARIA, FINDERS, JOZEF MARIA, VANDENBERGHE, GEERT, VAN HAREN, RICHARD JOHANNES FRANCISCUS, VAN DER HOFF, ALEXANDER HENDRIKUS MARTINUS
Year of Publication 23.03.2005
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Year of Publication 23.03.2005
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MARKER STRUCTURE FOR ALIGNMENT OR OVERLAY TO CORRECT PATTERN INDUCED DISPLACEMENT, MASK PATTERN FOR DEFINING SUCH A MARKER STRUCTURE AND LITHOGRAPHIC PROJECTION APPARATUS USING SUCH A MASK PATTERN
HENDRICKX, ERIC HENRI JAN, DUSA, MIRCEA, RICHARD JOHANNES FRANCISCUS, COLINA, LUIS ALBERTO COLINA SANTAMARIA, ALEXANDER HENDRIKUS MARTINUS, FINDERS, JOZEF MARIA, VANDENBERGHE, GEERT, VAN DER HOFF, VAN HAREN
Year of Publication 28.02.2005
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Year of Publication 28.02.2005
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Marker structure, mask pattern, alignment method and lithographic method and apparatus
DUSA MIRCEA, COLINA LUIS ALBERTO COLINA SANTAMARIA, HENDRICKX ERIC HENRI JAN, FINDERS JOZEF MARIA, VAN HAREN RICHARD JOHANNES FRANCISCUS, VANDENBERGHE GEERT, VAN DER HOFF ALEXANDER HENDRIKUS MARTINUS
Year of Publication 10.02.2005
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Year of Publication 10.02.2005
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MARKER STRUCTURE FOR ALIGNMENT OR OVERLAY TO CORRECT PATTERN INDUCED DISPLACEMENT, MASK PATTERN TO DEFINE THE MARKER STRUCTURE, AND LITHOGRAPHIC PROJECTING APPARATUS USING THE MASK PATTERN
DUSA MIRCEA, COLINA LUIS ALBERTO COLINA SANTAMARIA, HENDRICKX ERIC HENRI JAN, FINDERS JOZEF MARIA, VAN HAREN RICHARD JOHANNES FRANCISCUS, VANDENBERGHE GEERT, VAN DER HOFF ALEXANDER HENDRIKUS MARTINUS
Year of Publication 03.02.2005
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Year of Publication 03.02.2005
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Marker structure for alignment or overlay
HENDRICKX, ERIC HENRI JAN, DUSA, MIRCEA, COLINA, LUIS ALBERTO COLINA SANTAMARIA, FINDERS, JOZEF MARIA, VANDENBERGHE, GEERT, VAN HAREN, RICHARD JOHANNES FRANCISCUS, VAN DER HOFF, ALEXANDER HENDRIKUS MARTINUS
Year of Publication 19.01.2005
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Year of Publication 19.01.2005
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Marker structure for alignment or overlay to correct pattern induced displacement, mask pattern for defining such a marker structure and lithographic projection apparatus using such a mask pattern
HENDRICKX, ERIC HENRI JAN, DUSA, MIRCEA, COLINA, LUIS ALBERTO COLINA SANTAMARIA, FINDERS, JOZEF MARIA, VANDENBERGHE, GEERT, VAN HAREN, RICHARD JOHANNES FRANCISCUS, VAN DER HOFF, ALEXANDER HENDRIKUS MARTINUS
Year of Publication 16.02.2005
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Year of Publication 16.02.2005
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