기판 프로세싱 시스템들의 강화된 차폐를 위한 넓은 커버리지 에지 링
CHOU SHANG I, GRAGG GARY, GAJUDO GIOVANNI PAOLO, O'NEILL ROBERT G, WANG DANDAN
Year of Publication 18.07.2024
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Year of Publication 18.07.2024
Patent
SYSTEM, METHOD AND APPARATUS FOR RF POWER COMPENSATION IN PLASMA ETCH CHAMBER
CHOU SHANG I, RAMACHANDRAN SEETHARAMAN, SATO ARTHUR, TONNIS ERIC, O'NEILL ROBERT G
Year of Publication 03.12.2014
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Year of Publication 03.12.2014
Patent
Diode–Laser Measurements of He-, Ar-, and N2-Broadened HF Lineshapes in the First Overtone Band
Chou, Shang-I, Baer, Douglas S., Hanson, Ronald K.
Published in Journal of molecular spectroscopy (01.07.1999)
Published in Journal of molecular spectroscopy (01.07.1999)
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Journal Article
METHOD AND APPARATUS OF HALOGEN REMOVAL
CHOU SHANG I, RAMACHANDRAN SEETHARAMAN, CASAES RAPHAEL, SANT SANKET, SINGH HARMEET, VAHEDI VAHID
Year of Publication 21.08.2012
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Year of Publication 21.08.2012
Patent
WIDE-COVERAGE EDGE RING FOR ENHANCED SHIELDING IN SUBSTRATE PROCESSING SYSTEMS
GAJUDO, Giovanni Paolo, GRAGG, Gary, CHOU, Shang-I, WANG, Dandan, O'NEILL, Robert G
Year of Publication 09.10.2024
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Year of Publication 09.10.2024
Patent
WIDE-COVERAGE EDGE RING FOR ENHANCED SHIELDING IN SUBSTRATE PROCESSING SYSTEMS
GAJUDO, Giovanni Paolo, GRAGG, Gary, CHOU, Shang-I, WANG, Dandan, O'NEILL, Robert G
Year of Publication 08.06.2023
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Year of Publication 08.06.2023
Patent
Wide-coverage edge ring for enhanced shielding in substrate processing systems
CHOU, SHANG-I, GRAGG, GARY, GAJUDO, GIOVANNI PAOLO, O''NEILL, ROBERT, WANG, DAN-DAN
Year of Publication 16.06.2023
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Year of Publication 16.06.2023
Patent
Wide-coverage edge ring and edge ring system for enhanced shielding in substrate processing systems
CHOU, SHANG-I, GRAGG, GARY, GAJUDO, GIOVANNI PAOLO, WANG, DAN-DAN, O'NEILL, ROBERT
Year of Publication 21.04.2023
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Year of Publication 21.04.2023
Patent
Wide cover edge ring for enhanced shielding in substrate processing systems
CHOU, SHANG-I, GAYUDO GIOVANNI PAUL, O 'NEIL ROBERT, GRAGE, GARY, WANG DANDAN
Year of Publication 06.09.2022
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Year of Publication 06.09.2022
Patent
System, method and apparatus for RF power compensation in plasma etch chamber
Ramachandran Seetharaman, Chou Shang-I, O'Neill Robert G, Tonnis Eric, Sato Arthur
Year of Publication 09.08.2016
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Year of Publication 09.08.2016
Patent