Influence of Acid Diffusion Length on Line Edge Roughness in KrF Photoresists
Kim, Jae Hyun, Kim, Yong-Ho, Chon, Sang Mun, Nagai, Tomoki, Noda, Masahiro, Yamaguchi, Yoshikazu, Makita, Yutaka, Nemoto, Hiroaki
Published in Journal of Photopolymer Science and Technology (01.01.2004)
Published in Journal of Photopolymer Science and Technology (01.01.2004)
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Journal Article
Influence of Exhaust Pressure on Photosensitivity in Photo-definable Polyimide
Kim, Jae Hyun, Kim, Won Mi, Kim, Yong-Ho, Chon, Sang Mun, Yuba, Tomoyuki, Tomikawa, Masao
Published in Journal of Photopolymer Science and Technology (01.01.2004)
Published in Journal of Photopolymer Science and Technology (01.01.2004)
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Journal Article
METHOD AND APPARATUS FOR PREDICTING PHOTOLITHOGRAPHY PROCESS AND METHOD AND APPARATUS FOR MONITORING PHOTOLITHOGRAPHY PROCESS TO PREVIOUSLY DETERMINE POSSIBILITY OF ABNORMAL PHOTOLITHOGRAPHY PROCESS AND CHECK ABNORMALITY OF PHOTORESIST PATTERN FORMED ON SEMICONDUCTOR SUBSTRATE IN REAL TIME
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Patent
METHOD AND APPARATUS OF INSPECTING SURFACE OF WAFER FOR PERFORMING ACCURATE SURFACE INSPECTION PROCESS BY USING WAFER LOCATION INFORMATION TO CORRECT LOCATION OF WAFER
JUN, CHUNG SAM, KIM, JOUNG SOO, EOM, TAE MIN, KIM, MOON KYUNG, YANG, YU SIN, CHOI, SUN YONG, CHON, SANG MUN, JEE, YUN JUNG
Year of Publication 10.01.2005
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Year of Publication 10.01.2005
Patent
Development of automated contact inspection system using in-line CD SEM
Sang-Mun Chon, Sang-Bong Choi, Yong-Wan Kim, Kye-Weon Kim, Kyu-Hong Lim, Sun-Yong Choi, Chung-Sam Jun
Published in 2001 IEEE International Symposium on Semiconductor Manufacturing. ISSM 2001. Conference Proceedings (Cat. No.01CH37203) (2001)
Published in 2001 IEEE International Symposium on Semiconductor Manufacturing. ISSM 2001. Conference Proceedings (Cat. No.01CH37203) (2001)
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Conference Proceeding
Improvement of Defect Issues for Advanced 193nm Resist
Kim, KyungMee, Kim, JaeHo, Kim, YoungHo, Kim, SangMun
Published in Journal of Photopolymer Science and Technology (01.01.2004)
Published in Journal of Photopolymer Science and Technology (01.01.2004)
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Journal Article