AN APPARATUS AND METHOD OF FORMING A POLISHING ARTICLE THAT HAS A DESIRED ZETA POTENTIAL
CHOCKALINGAM ASHWIN, FU BOYI, BAJAJ RAJEEV, ORILALL MAHENDRA C, REDFIELD DANIEL, YAMAMURA MAYU
Year of Publication 15.12.2023
Get full text
Year of Publication 15.12.2023
Patent
Investigation of the Impact of Pad Surface Texture from Different Pad Conditioners on the CMP Performance
Khanna, Aniruddh J., Yamamura, Mayu, Kakireddy, Veera Raghava, Chockalingam, Ashwin, Jawali, Puneet, Baradanahalli Kenchappa, Nandan, Hariharan, Venkat, Redfield, Daniel, Bajaj, Rajeev
Published in ECS journal of solid state science and technology (03.08.2020)
Published in ECS journal of solid state science and technology (03.08.2020)
Get full text
Journal Article
Engineering Surface Texture of Pads for Improving CMP Performance of Sub-10 nm Nodes
Khanna, Aniruddh J., Kakireddy, Veera Raghava, Fung, Jason, Yamamura, Mayu, Jawali, Puneet, Chockalingam, Ashwin, Baradanahalli Kenchappa, Nandan, Redfield, Daniel, Bajaj, Rajeev
Published in ECS journal of solid state science and technology (12.10.2020)
Published in ECS journal of solid state science and technology (12.10.2020)
Get full text
Journal Article
POLISHING PADS FORMED USING AN ADDITIVE MANUFACTURING PROCESS AND METHODS RELATED THERETO
CHOCKALINGAM ASHWIN, GANAPATHIAPPAN SIVAPACKIA, BAJAJ RAJEEV, REDFIELD DANIEL, FUNG JASON G
Year of Publication 30.03.2023
Get full text
Year of Publication 30.03.2023
Patent
Methodology for pad conditioning sweep optimization for advanced nodes
Khanna, Aniruddh J., Jawali, Puneet, Redfield, Daniel, Kakireddy, Raghava, Chockalingam, Ashwin, Benvegnu, Dominic, Yang, Mo, Rozo, Sebastian, Fung, Jason, Cornejo, Mario, Abramson, Igor, Yamamura, Mayu, Yuan, Zhibo, Bajaj, Rajeev
Published in Microelectronic engineering (15.08.2019)
Published in Microelectronic engineering (15.08.2019)
Get full text
Journal Article
POROUS CHEMICAL MECHANICAL POLISHING PADS
GANAPATHIAPPAN SIVAPACKIA, FU BOYI, CHOCKALINGAM ASHWIN, PATIBANDLA NAG B, BAJAJ RAJEEV, ORILALL MAHENDRA C, REDFIELD DANIEL, YAMAMURA MAYU, REDEKER FRED C
Year of Publication 02.02.2024
Get full text
Year of Publication 02.02.2024
Patent
POLISHING PAD WITH WINDOW AND MANUFACTURING METHODS THEREOF
CORNEJO MARIO DAGIO, FU BOYI, GANAPATHIAPPAN SIVAPACKIA, CHOCKALINGAM ASHWIN, PATIBANDLA NAG B, BAJAJ RAJEEV, BENVEGNU DOMINIC J, REDFIELD DANIEL, VORA ANKIT, YAMAMURA MAYU
Year of Publication 01.02.2024
Get full text
Year of Publication 01.02.2024
Patent
개선된 기공 구조를 갖는 연마 패드들
SRIDHAR UMA, LUO YINGDONG, GANAPATHIAPPAN SIVAPACKIA, CHOCKALINGAM ASHWIN, PATIBANDLA NAG B, ROZO SEBASTIAN DAVID, BAJAJ RAJEEV, MADHUSOODHANAN SUDHAKAR, REDFIELD DANIEL, NG HOU T, YAMAMURA MAYU
Year of Publication 22.01.2024
Get full text
Year of Publication 22.01.2024
Patent
Impact of Pad Material Properties on CMP Performance for Sub-10nm Technologies
Khanna, Aniruddh J., Kakireddy, Raghava, Jawali, Puneet, Chockalingam, Ashwin, Redfield, Daniel, Bajaj, Rajeev, Fung, Jason, Cornejo, Mario, Yamamura, Mayu, Yuan, Zhibo, Orilall, Chris, Fu, Boyi, Ganapathi, Gana, Redeker, Fred C, Patibandla, Nag B
Published in ECS journal of solid state science and technology (2019)
Published in ECS journal of solid state science and technology (2019)
Get full text
Journal Article
적층 제조 프로세스를 사용하여 형성되는 폴리싱 패드들 및 이와 관련된 방법들
CHOCKALINGAM ASHWIN, GANAPATHIAPPAN SIVAPACKIA, BAJAJ RAJEEV, REDFIELD DANIEL, FUNG JASON G
Year of Publication 19.02.2021
Get full text
Year of Publication 19.02.2021
Patent
Potassium Periodate-Based Solutions for Minimizing Galvanic Corrosion at the Cu-Mn Interface and for Polishing the Associated Cu Interconnect Structures
Chockalingam, Ashwin M., Lagudu, Uma Rames K., Babu, S. V.
Published in ECS journal of solid state science and technology (01.01.2013)
Published in ECS journal of solid state science and technology (01.01.2013)
Get full text
Journal Article
연마 패드들의 적층 제조
LUO YINGDONG, CHOCKALINGAM ASHWIN MURUGAPPAN, SRIDHAR UMA, GANAPATHIAPPAN SIVAPACKIA, PATIBANDLA NAG B, BAJAJ RAJEEV, MADHUSOODHANAN SUDHAKAR, REDFIELD DANIEL, NG HOU T, ZHANG DAIHUA
Year of Publication 18.04.2022
Get full text
Year of Publication 18.04.2022
Patent
친수성 및 제타 전위 조정가능한 화학적 기계적 연마 패드들
GANAPATHIAPPAN SIVAPACKIA, FU BOYI, CHOCKALINGAM ASHWIN, PATIBANDLA NAG B, BAJAJ RAJEEV, MADHUSOODHANAN SUDHAKAR, REDFIELD DANIEL, NG HOU T, VORA ANKIT
Year of Publication 16.12.2020
Get full text
Year of Publication 16.12.2020
Patent
POLISHING PADS PRODUCED BY AN ADDITIVE MANUFACTURING PROCESS
FU BOYI, CHOCKALINGAM ASHWIN, YAMAMURA MAYU FELICIA, PATIBANDLA NAG B, DAVENPORT ROB, ORILALL MAHENDRA C, KHANNA ANIRUDDH JAGDISH, FUNG JASON G, KUMAR ASHAVANI, HARIHARAN VENKATACHALAM, CORNEJO MARIO, KAKIREDDY RAGHAVA, BAJAJ RAJEEV, NG HOU TEE, SINHA AMRITANSHU, REDFIELD DANIEL, MENK GREGORY E, REDEKER FRED C
Year of Publication 03.11.2022
Get full text
Year of Publication 03.11.2022
Patent
POLISHING PADS PRODUCED BY AN ADDITIVE MANUFACTURING PROCESS
FU BOYI, CHOCKALINGAM ASHWIN, YAMAMURA MAYU FELICIA, PATIBANDLA NAG B, DAVENPORT ROB, ORILALL MAHENDRA C, KHANNA ANIRUDDH JAGDISH, FUNG JASON G, KUMAR ASHAVANI, HARIHARAN VENKATACHALAM, CORNEJO MARIO, KAKIREDDY RAGHAVA, BAJAJ RAJEEV, NG HOU TEE, SINHA AMRITANSHU, REDFIELD DANIEL, MENK GREGORY E, REDEKER FRED C
Year of Publication 01.11.2022
Get full text
Year of Publication 01.11.2022
Patent