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Year of Publication 27.09.2024
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METHOD FOR PREPARING RUTHENIUM-CONTAINING THIN FILM
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Year of Publication 26.09.2024
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Method of depositing a silicon-containing layer using a heterocyclic group
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Year of Publication 05.10.2023
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Silicon precursor having a heterocyclic group composition for depositing a silicon-containing layer comprising the same and method of depositing a silicon-containing layer using the same
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Year of Publication 05.10.2023
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KOIDE TAKANORI, CHO YOUNJOUNG, PARK GYU HEE, LIM JAESOON, MANABE YOSHIKI, KIMURA MASAYUKI, SAITO AKIO
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Year of Publication 07.07.2020
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Method for forming thin film
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Year of Publication 22.04.2021
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Year of Publication 25.11.2020
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Cobalt precursor method for manufacturing cobalt containing layer using the same and method for manufacturing semiconductor device using the same
MIYAZAKI TAKAMASA, SATOU YOUSUKE, SUGIMOTO KOUHEI, CHO YOUNJOUNG, NIHEI HIROSHI, SHIRAI MASASHI, KIM YOUNSOO, LIM JAESOON, LEE SOYOUNG
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Year of Publication 03.11.2020
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Gas storage cylinder Deposition system and Method of manufacturing semiconductor device
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Year of Publication 16.10.2019
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Year of Publication 16.10.2019
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Molybdenum compound and method of manufacturing integrated circuit device using the same
Sato, Haruyoshi, Cho, Younjoung, Uchiuzou, Hiroyuki, Park, Gyuhee, Harano, Kazuki
Year of Publication 05.09.2023
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Year of Publication 05.09.2023
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