Polymer and chemically amplified resist composition containing the same
JOO HYUN-SANG, CHO SEONG-DUK, LIM YOUNG-TAEK, KIM CHANG-MIN, SEO DONGUL, PARK JOO-HYEON
Year of Publication 23.10.2007
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Year of Publication 23.10.2007
Patent
Polymer and chemically amplified resist composition containing the same
Lim, Young-Taek, Park, Joo-Hyeon, Seo, Dong-Chul, Kim, Chang-Min, Cho, Seong-Duk, Joo, Hyun-Sang
Year of Publication 23.10.2007
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Year of Publication 23.10.2007
Patent
Acid-labile polymer and resist composition
KIM, SEONG-JU, JOO, HYUN-SANG, PARK, JOO-HYEON, CHO, SEONG-DUK, LIM, YOUNG-TAEK, SEO, DONGUL
Year of Publication 19.09.2007
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Year of Publication 19.09.2007
Patent
Acid-labile polymer and photoresist composition containing the same
JOO, HYUN-SANG, PARK, JOO-HYEON, CHO, SEONG-DUK, LIM, YOUNG-TAEK, SEO, DONGUL
Year of Publication 21.12.2004
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Year of Publication 21.12.2004
Patent
Copolymer of alicyclic olefin having secondary hydroxyl group and acryl compound, and chemically amplified resist composition containing the same
JOO HYUN-SANG, KIM KYOUNG-MUN, CHO SEONG-DUK, LIM YOUNG-TAEK, SONG JI-YOUNG, SEO DONGUL, PARK JOO-HYEON
Year of Publication 05.02.2008
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Year of Publication 05.02.2008
Patent
Copolymer of alicyclic olefin having secondary hydroxyl group and acryl compound, and chemically amplified resist composition containing the same
Joo, Hyun-Sang, Park, Joo-Hyeon, Seo, Dong-Chul, Lim, Young-Taek, Cho, Seong-Duk, Song, Ji-Young, Kim, Kyoung-Mun
Year of Publication 05.02.2008
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Year of Publication 05.02.2008
Patent
NEW POLYMER AND CHEMICAL AMPLIFICATION TYPE RESIST COMPRISING THE SAME
JOO HYUN-SANG, CHO SEONG-DUK, LIM YOUNG-TAEK, KIM CHANG-MIN, SEO DONGUL, PARK JOO-HYEON
Year of Publication 21.07.2005
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Year of Publication 21.07.2005
Patent
NOVEL POLYMERS AND THE CHEMICALLY AMPLIFIED RESIST CONTAINING IT
SEO, DONG CHUL, JOO, HYUN SANG, LIM, YOUNG TAEK, KIM, CHANG MIN, CHO, SEONG DUK, PARK, JOO HYEON
Year of Publication 19.07.2005
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Year of Publication 19.07.2005
Patent
Novel polymer and chemically amplified resist composition containing the same
JOO HYUN-SANG, CHO SEONG-DUK, LIM YOUNG-TAEK, KIM CHANG-MIN, SEO DONGUL, PARK JOO-HYEON
Year of Publication 14.07.2005
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Year of Publication 14.07.2005
Patent
COPOLYMER OF SECONDARY HYDROXY GROUP-BEARING ALKYL CYCLIC OLEFIN AND ACRYLIC COMPOUND, AND CHEMICAL AMPLIFICATION-TYPE RESIST COMPOSITION CONTAINING THE COPOLYMER
JOO HYUN-SANG, KIM KYOUNG-MUN, CHO SEONG-DUK, LIM YOUNG-TAEK, SONG JI-YOUNG, SEO DONGUL, PARK JOO-HYEON
Year of Publication 23.03.2006
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Year of Publication 23.03.2006
Patent
COPOLYMER BY ALICYCLIC OLEFIN HAVING SECONDARY HYDROXYL GROUP AND ACRYL COMPOUND AND CHEMICALLY AMPLIFIED RESIST COMPOSITION CONTAINING IT
KIM, KYOUNG MUN, SEO, DONG CHUL, SONG, JI YOUNG, JOO, HYUN SANG, LIM, YOUNG TAEK, CHO, SEONG DUK, PARK, JOO HYEON
Year of Publication 16.03.2006
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Year of Publication 16.03.2006
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Colpolymer of alicyclic olefin having secondary hydroxyl group and acryl compound, and chemically amplified resist composition containing the same
JOO HYUN-SANG, KIM KYOUNG-MUN, CHO SEONG-DUK, LIM YOUNG-TAEK, SONG JI-YOUNG, SEO DONGUL, PARK JOO-HYEON
Year of Publication 16.03.2006
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Year of Publication 16.03.2006
Patent
Acid-labile polymer and resist composition
KIM, SEONG-JU, JOO, HYUN-SANG, PARK, JOO-HYEON, CHO, SEONG-DUK, LIM, YOUNG-TAEK, SEO, DONGUL
Year of Publication 06.11.2002
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Year of Publication 06.11.2002
Patent