Post-Cu CMP cleaning for colloidal silica abrasive removal
Chen, Po-Lin, Chen, Jyh-Herng, Tsai, Ming-Shih, Dai, Bau-Tong, Yeh, Ching-Fa
Published in Microelectronic engineering (01.11.2004)
Published in Microelectronic engineering (01.11.2004)
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Journal Article
Novel post CMP cleaning using buffered HF solution and ozone water
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Journal Article
Conference Proceeding
Influence of measuring environment on the electrical characteristics of pentacene-based thin film transistors
Wang, Yu-Wu, Cheng, Horng-Long, Wang, Yi-Kai, Hu, Tang-Hsiang, Ho, Jia-Chong, Lee, Cheng-Chung, Lei, Tan-Fu, Yeh, Ching-Fa
Published in Thin solid films (22.11.2004)
Published in Thin solid films (22.11.2004)
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Journal Article
Modeling of the wear mechanism during chemical-mechanical polishing
LIU, C.-W, DAI, B.-T, TSENG, W.-T, YEH, C.-F
Published in Journal of the Electrochemical Society (01.02.1996)
Published in Journal of the Electrochemical Society (01.02.1996)
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Journal Article
The removal of airborne molecular contamination in cleanroom using PTFE and chemical filters
Ching-Fa Yeh, Chih-Wen Hsiao, Shiuan-Jeng Lin, Chih-Min Hsieh, Kusumi, T., Aomi, H., Kaneko, H., Bau-Tong Dai, Ming-Shih Tsai
Published in IEEE transactions on semiconductor manufacturing (01.05.2004)
Published in IEEE transactions on semiconductor manufacturing (01.05.2004)
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Journal Article
A novel lightly doped drain polysilicon thin-film transistor with oxide sidewall spacer formed by one-step selective liquid phase deposition
Shih, Po-Sheng, Chang, Chun-Yen, Chang, Ting-Chang, Huang, Tiao-Yuan, Peng, Du-Zen, Yeh, Ching-Fa
Published in IEEE electron device letters (01.08.1999)
Published in IEEE electron device letters (01.08.1999)
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Journal Article
Effects of mechanical characteristics on the chemical-mechanical polishing of dielectric thin films
Tseng, Wei-Tsu, Liu, Chi-Wen, Dai, Bau-Tong, Yeh, Ching-Fa
Published in Thin solid films (15.12.1996)
Published in Thin solid films (15.12.1996)
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Journal Article
Novel contact hole fabrication using selective liquid-phase deposition instead of reactive ion etching
Yeh, Ching-Fa, Liu, Chien-Hung, Su, Jwinn-Lein
Published in IEEE electron device letters (01.01.1999)
Published in IEEE electron device letters (01.01.1999)
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Journal Article
Application of plasma immersion ion implantation doping to low-temperature processed poly-Si TFTs
Ching-Fa Yeh, Tai-Ju Chen, Chung Liu, Jiqun Shao, Cheung, N.W.
Published in IEEE electron device letters (01.11.1998)
Published in IEEE electron device letters (01.11.1998)
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Journal Article
Effects of plasma treatment on the properties of room-temperature liquid-phase deposited (LPD) oxide films
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Journal Article
Conference Proceeding
Improved I-V characteristics of polysilicon thin film transistors with novel dual-buffer drain structure
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Conference Proceeding
Journal Article