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COBALT PRECURSORS
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ALD PROCESSES FOR LOW LEAKAGE CURRENT AND LOW EQUIVALENT OXIDE THICKNESS BITAO FILMS
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Year of Publication 30.10.2024
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Year of Publication 30.10.2024
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SILICON PRECURSOR COMPOUNDS AND METHOD FOR FORMING SILICON-CONTAINING FILMS
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Year of Publication 30.10.2024
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Year of Publication 30.10.2024
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VAPOR DEPOSITION PRECURSOR COMPOUNDS AND PROCESS OF USE
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Year of Publication 19.04.2023
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METHODS FOR DEPOSITING TUNGSTEN OR MOLYBDENUM FILMS
Baum, Thomas H, Wang, Han, Hendrix, Bryan C, Chen, Philip S. H, Nguyen, Shawn D, Wright, JR., Robert
Year of Publication 01.02.2024
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Year of Publication 01.02.2024
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Vapor deposition of molybdenum using a bis(alkyl-arene) molybdenum precursor
Baum, Thomas H, Hendrix, Bryan C, Meng, Shuang, Chen, Philip S. H, Wright, Jr., Robert
Year of Publication 24.01.2023
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Year of Publication 24.01.2023
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