Reduction and non-uniformity of high density plasma process induced electrical degradation in MOS devices
Pei-Jer Tzeng, Jen-Chieh Li, Chun-Chen Yeh, Kuei-Shu Chang-Liao
Published in 1999 4th International Symposium on Plasma Process-Induced Damage (IEEE Cat. No.99TH8395) (1999)
Published in 1999 4th International Symposium on Plasma Process-Induced Damage (IEEE Cat. No.99TH8395) (1999)
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Conference Proceeding
Charge trapping device and method for manufacturing the same
YE, ZONG HAO, CHANG LIAO, KUEI SHU, LIU, CHU YUNG, TSAI, PINGHUNG, TZEN, PEI JER, LIU, TE CHIANG
Year of Publication 11.02.2014
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Year of Publication 11.02.2014
Patent
Process techniques and electrical characterization for high-k (HfO/sub x/N/sub y/) gate dielectric in MOS devices
Kuei-Shu Chang-Liao, Chun-Yuan Lu, Chin-Lung Cheng, Tien-Ko Wang
Published in Proceedings. 7th International Conference on Solid-State and Integrated Circuits Technology, 2004 (2004)
Published in Proceedings. 7th International Conference on Solid-State and Integrated Circuits Technology, 2004 (2004)
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Conference Proceeding
Improvement of radiation hardness of MOS device by use of amorphous Si
Chang-Liao, K., Chi-Chih Chuang
Published in International Electron Devices and Materials Symposium (1994)
Published in International Electron Devices and Materials Symposium (1994)
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Conference Proceeding