Method of processing a workpiece in a plasma reactor with dynamic adjustment of the plasma source power applicator and the workpiece relative to one another
BIVENS DARIN, PANAYIL SHEEBA J, IBRAHIM IBRAHIM M, KUMAR AJAY, GRIMBERGEN MICHAEL N, LEWINGTON RICHARD, KOCH RENEE, CHANDRACHOOD MADHAVI R
Year of Publication 08.11.2007
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Year of Publication 08.11.2007
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INDUCTIVELY COUPLED PLASMA REACTOR HAVING RF PHASE CONTROL AND METHODS OF USE THEREOF
TODOROW VALENTIN N, OUYE ALAN HIROSHI, BIVENS DARIN, LEUNG TOI YUE BECKY, IBRAHIM IBRAHIM M, SABHARWAL AMITABH, YU KEVEN KAISHENG, KUMAR AJAY, GRIMBERGEN MICHAEL N, LEWINGTON RICHARD, KOCH RENEE, CHANDRACHOOD MADHAVI R
Year of Publication 04.11.2010
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Year of Publication 04.11.2010
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Method And Apparatus For Photomask Plasma Etching
BIVENS DARIN, PANAYIL SHEEBA J, SABHARWAL AMITABH, KUMAR AJAY, OUYE ALAN HIROSH, LEWINGTON RICHARD, CHANDRACHOOD MADHAVI R
Year of Publication 10.09.2014
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Year of Publication 10.09.2014
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Method and apparatus for fabricating plasma reactor parts
SABHARWAL, AMITABH, YUAN, JIE, BIVENS, DARIN, LEWINGTON, RICHARD, SUN, JEFFIFER, RYABOVA, ELMIRA, CHANDRACHOOD, MADHAVI R
Year of Publication 01.06.2013
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Year of Publication 01.06.2013
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Mask etch plasma reactor with cathode providing a uniform distribution of etch rate
BIVENS DARIN, KUMAR AJAY, GRIMBERGEN MICHAEL N, LEWINGTON RICHARD, NGUYEN KHIEM K, CHANDRACHOOD MADHAVI R
Year of Publication 19.12.2012
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Year of Publication 19.12.2012
Patent
Method and device for preparing plasma reaction parts
YUAN JIE, BIVENS DARIN, SUN JENNIFER, SABHARWAL AMITABH, RYABOVA ELMIRA, LEWINGTON RICHARD, CHANDRACHOOD MADHAVI R
Year of Publication 25.07.2012
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Year of Publication 25.07.2012
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Method and apparatus for photomask plasma etching
SABHARWAL, AMITABH, OUYE, ALAN HIROSHI, BIVENS, DARIN, KUMAR, AJAY, LEWINGTON, RICHARD, PANAYIL, SHEEBA J, CHANDRACHOOD, MADHAVI R
Year of Publication 01.09.2013
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Year of Publication 01.09.2013
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Method and apparatus for photomask plasma etching
SABHARWAL, AMITABH, OUYE, ALAN HIROSHI, BIVENS, DARIN, KUMAR, AJAY, LEWINGTON, RICHARD, PANAYIL, SHEEBA J, CHANDRACHOOD, MADHAVI R
Year of Publication 11.02.2013
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Year of Publication 11.02.2013
Patent
Mask etch plasma reactor with variable process gas distribution
PANAYIL SHEEBA J, IBRAHIM IBRAHIM M, KUMAR AJAY, GRIMBERGEN MICHAEL N, LEWINGTON RICHARD, NGUYEN KHIEM K, CHANDRACHOOD MADHAVI R
Year of Publication 26.09.2012
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Year of Publication 26.09.2012
Patent
Mask etch plasma reactor with variable process gas distribution
KUMAR, AJAY, LEWINGTON, RICHARD, IBRAHIM, IBRAHIM M, GRIMBERGEN, MICHAEL N, NGUYEN, KHIEM K, PANAYIL, SHEEBA J, CHANDRACHOOD, MADHAVI R
Year of Publication 01.06.2012
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Year of Publication 01.06.2012
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Plasma reactor with a dynamically adjustable plasma source power applicator
BIVENS DARIN, PANAYIL SHEEBA J, IBRAHIM IBRAHIM M, KUMAR AJAY, GRIMBERGEN MICHAEL N, LEWINGTON RICHARD, KOCH RENEE, CHANDRACHOOD MADHAVI R
Year of Publication 01.06.2011
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Year of Publication 01.06.2011
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Mask etch plasma reactor with cathode lift pin assembly
RICHARD, LEWINGTON, KUMAR, AJAY, MICHAEL N., GRIMBERGEN, KHIEM K., NGUYEN, DARIN, BIVENS, MADHAVI R., CHANDRACHOOD
Year of Publication 21.10.2008
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Year of Publication 21.10.2008
Patent
Method and apparatus for fabricating plasma reactor parts
SABHARWAL, AMITABH, YUAN, JIE, BIVENS, DARIN, LEWINGTON, RICHARD, SUN, JEFFIFER, RYABOVA, ELMIRA, CHANDRACHOOD, MADHAVI R
Year of Publication 16.07.2008
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Year of Publication 16.07.2008
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Workpiece rotation apparatus for a plasma reactor system
KUMAR, AJAY, LEWINGTON, RICHARD, IBRAHIM, IBRAHIM M, ANDERSON, SCOTT ALAN, NGUYEN, KHIEM K, CHANDRACHOOD, MADHAVI R
Year of Publication 16.05.2008
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Year of Publication 16.05.2008
Patent
Mask etch process
GRIMBERGEN, MICHAEL, SABHARWAL, AMITABH, LEUNG, TOI YUE BECKY, CHANDRACHOOD, MADHAVI R
Year of Publication 01.05.2008
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Year of Publication 01.05.2008
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