Plasma-enhanced chemical vapor deposition of silicon dioxide deposited at low temperatures
CEILER, M. F, KOHL, P. A, BIDSTRUP, S. A
Published in Journal of the Electrochemical Society (01.06.1995)
Published in Journal of the Electrochemical Society (01.06.1995)
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Journal Article
Improvement in dielectric properties of low temperature PECVD silicon dioxide by reaction with hydrazine
VOGT, K. W, HOUSTON, M, CEILER, M. F, ROBERTS, C. E, KOHL, P. A
Published in Journal of electronic materials (01.06.1995)
Published in Journal of electronic materials (01.06.1995)
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Journal Article
Plasma‐Enhanced Chemical Vapor Deposition of Silicon Dioxide Deposited at Low Temperatures
Ceiler, M. F., Kohl, P. A., Bidstrup, S. A.
Published in Journal of the Electrochemical Society (01.06.1995)
Published in Journal of the Electrochemical Society (01.06.1995)
Get full text
Journal Article