Unraveling the Mechanism of Maskless Nanopatterning of Black Silicon by CF4/H2 Plasma Reactive-Ion Etching
Ghezzi, Francesco, Pedroni, Matteo, Kovač, Janez, Causa, Federica, Cremona, Anna, Anderle, Mariano, Caniello, Roberto, Pietralunga, Silvia M., Vassallo, Espedito
Published in ACS omega (26.07.2022)
Published in ACS omega (26.07.2022)
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Published in Radiologia medica (01.03.2014)
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Published in Journal of physics. D, Applied physics (13.09.2024)
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Published in Journal of physical chemistry. C (23.10.2014)
Published in Journal of physical chemistry. C (23.10.2014)
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Unraveling the Mechanism of Maskless Nanopatterning of Black Silicon by CF 4 /H 2 Plasma Reactive-Ion Etching
Ghezzi, Francesco, Pedroni, Matteo, Kovač, Janez, Causa, Federica, Cremona, Anna, Anderle, Mariano, Caniello, Roberto, Pietralunga, Silvia M., Vassallo, Espedito
Published in ACS omega (26.07.2022)
Published in ACS omega (26.07.2022)
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Published in Calphad (01.12.2015)
Published in Calphad (01.12.2015)
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Published in Journal of crystal growth (01.10.2008)
Published in Journal of crystal growth (01.10.2008)
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A procedure to estimate pitch angle for runaways electrons control in fusion reactors
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Published in 2019 18th European Control Conference (ECC) (01.06.2019)
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