Search Results - "CAPELLI, RENZO" :: K.UTB vyhledávací portál

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EUV 리소그라피용 마스크를 검사하기 위한 시스템 및 방법

by CAPELLI RENZO
Year of Publication 08.11.2022

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EUV METROLOGY SYSTEM FOR EXAMINING OBJECTS WITH EUV MEASUREMENT LIGHT

by CAPELLI RENZO, GWOSCH KLAUS
Year of Publication 02.06.2023

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Method for measuring an effect of a wavelength-dependent measuring light reflectivity and an effect of a polarization of measuring light on a measuring light impingement on a lithography mask

by CAPELLI RENZO, PAULS WALTER
Year of Publication 03.11.2022

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측정될 객체의 생산 에어리얼 이미지를 결정하기 위한 방법

by CAPELLI RENZO, DIETZEL MARTIN
Year of Publication 14.02.2022

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Method for determining an imaging quality of an optical system when illuminated by illumination light within a pupil to be measured

by CAPELLI RENZO, GWOSCH KLAUS, KOCH MARKUS, SIMAKOV DMITRY
Year of Publication 05.12.2022

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METHOD AND APPARATUS FOR QUALIFYING A MASK FOR USE IN LITHOGRAPHY

by CAPELLI RENZO, KERSTEEN GRIZELDA, HELBIG TIM, HOFFMANN SANDRO, KOCH MARKUS, NIEDERHAUSEN THOMAS, VERCH ANDREAS
Year of Publication 18.03.2024

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METHOD FOR EXAMINING PHOTOLITHOGRAPHIC MASKS AND MASK METROLOGY APPARATUS FOR PERFORMING THE METHOD

by CAPELLI RENZO, KOCH MARKUS, HELLWEG DIRK
Year of Publication 20.03.2019

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구조화된 오브젝트의 표면에 대한 측정광 파장의 측정광의 광학적 위상차를 결정하는 방법

by HUSEMANN CHRISTOPH, CAPELLI RENZO, GEHRKE RALF, KERSTEEN GRIZELDA, KOCH MARKUS, HELLWEG DIRK
Year of Publication 20.06.2022

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측정 광에 대한 오브젝트의 반사도를 측정하는 방법 및 이를 수행하기 위한 계측 시스템

by CAPELLI RENZO, GWOSCH KLAUS, KERSTEEN GRIZELDA, KOCH MARKUS, PAULS WALTER, HELLWEG DIRK
Year of Publication 14.06.2022

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METHOD FOR DETERMINING A STRUCTURE-INDEPENDENT CONTRIBUTION OF A LITHOGRAPHY MASK TO A FLUCTUATION OF THE LINEWIDTH

by CAPELLI RENZO, DIETZEL MARTIN, KOCH MARKUS, HELLWEG DIRK
Year of Publication 29.08.2019

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METHOD FOR DETERMINING AN IMAGING ABERRATION CONTRIBUTION OF AN IMAGING OPTICAL UNIT FOR MEASURING LITHOGRAPHY MASKS

by CAPELLI RENZO, DIETZEL MARTIN, KOCH MARKUS, HELLWEG DIRK
Year of Publication 29.08.2019

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Method for determining a focus position of a lithography mask and metrology system for carrying out such a method

by CAPELLI RENZO, DIETZEL MARTIN, KOCH MARKUS, HELLWEG DIRK
Year of Publication 29.08.2019

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SYSTEM AND METHOD FOR INSPECTING A MASK FOR EUV LITHOGRAPHY

by Capelli, Renzo
Year of Publication 19.01.2023

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METHOD FOR PRODUCING A MASK FOR THE EXTREME ULTRAVIOLET WAVELENGTH RANGE MASK AND DEVICE

by CAPELLI RENZO, BLUMRICH JORG FREDERIK, PETERS JAN HENDRIK, GARETTO ANTHONY
Year of Publication 11.05.2017

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SYSTEM AND METHOD FOR INSPECTING A MASK FOR EUV LITHOGRAPHY

by CAPELLI, Renzo
Year of Publication 14.10.2021

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Metrology system for examining objects with EUV measurement light

by Capelli, Renzo, Gwosch, Klaus
Year of Publication 24.10.2023

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Method and apparatus for repairing defects of a photolithographic mask for the EUV range

by Capelli, Renzo, Steigerwald, Hendrik
Year of Publication 03.10.2023

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METROLOGY SYSTEM FOR EXAMINING OBJECTS WITH EUV MEASUREMENT LIGHT

by Capelli, Renzo, Gwosch, Klaus
Year of Publication 01.06.2023

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METHOD FOR MEASURING AN EFFECT OF A WAVELENGTH-DEPENDENT MEASURING LIGHT REFLECTIVITY AND AN EFFECT OF A POLARIZATION OF MEASURING LIGHT ON A MEASURING LIGHT IMPINGEMENT ON A LITHOGRAPHY MASK

by Pauls, Walter, Capelli, Renzo
Year of Publication 03.11.2022

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METHOD FOR DETERMINING A PRODUCTION AERIAL IMAGE OF AN OBJECT TO BE MEASURED

by Capelli, Renzo, Dietzel, Martin
Year of Publication 31.03.2022

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