Analytical Model for Redistribution Profile of Ion-Implanted Impurities During Solid-Phase Epitaxy
Suzuki, Kunihiro, Kataoka, Yuji, Nagayama, Susumu, Magee, Charles W., Buyuklimanli, Temel H., Nagayama, Tsutomu
Published in IEEE transactions on electron devices (01.02.2007)
Published in IEEE transactions on electron devices (01.02.2007)
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Journal Article
Resistivity of manganese doped GaN grown by near equilibrium ammonothermal (NEAT) method
Hashimoto, Tadao, Key, Daryl, Letts, Edward, Gaddy, Mathew, Gregory, Austin, Dickens, James, West, Tim, Zhao, Wei, Guo, Mengzhe, Buyuklimanli, Temel
Published in Journal of crystal growth (01.11.2023)
Published in Journal of crystal growth (01.11.2023)
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Journal Article
Strain/lattice characterization of Si + Ge, SiGe + Ge, SiGe + C and Si + GeSn surface layers formed by implantation with RTA or laser annealing using SIMS, XPS, TEM-EDX, XRD and Raman analysis
Borland, John, Komago, Shota, Yokogawa, Ryo, Yoshioka, Kazutoshi, Sawamoto, Naomi, Ogura, Atsushi, Goodman, Gary, Buyuklimanli, Temel
Published in MRS advances (23.02.2023)
Published in MRS advances (23.02.2023)
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Journal Article
(Invited) Differential Hall Effect Metrology (DHEM) Sub-Nm Profiling and Its Application to Dopant Activation in n-Type Ge
Ramesh, Pranav, Saraswat, Krishna C., Joshi, Abhijeet, Basol, Bulent M, Wang, Larry, Buyuklimanli, Temel
Published in ECS transactions (24.04.2020)
Published in ECS transactions (24.04.2020)
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Journal Article
Kinetics of nitrogen incorporation at the SiO2/4H-SiC interface during an NO passivation
Chen, Zengjun, Xu, Yi, Garfunkel, Eric, Feldman, Leonard C., Buyuklimanli, Temel, Ou, Wei, Serfass, Jeff, Wan, Alan, Dhar, Sarit
Published in Applied surface science (30.10.2014)
Published in Applied surface science (30.10.2014)
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Journal Article
Maximum Active Concentration of Ion-Implanted Phosphorus During Solid-Phase Epitaxial Recrystallization
Suzuki, Kunihiro, Tada, Yoko, Kataoka, Yuji, Kawamura, Kazuo, Nagayama, Tsutomu, Nagayama, Susumu, Magee, Charles W., Buyuklimanli, Temel H., Mueller, Dominik Christoph, Fichtner, Wolfgang, Zechner, Christoph
Published in IEEE transactions on electron devices (01.08.2007)
Published in IEEE transactions on electron devices (01.08.2007)
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Journal Article
Boosting Ge-Epi P-Well Mobility & Crystal Quality with Si or Sn Implantation and Melt Annealing
Borland, John O, Chaung, Shang-Shuin, Tseng, Tseung-Yuen, Joshi, Abhijeet, Basol, Bulent, Lee, Yao Jen, Kuroi, Takashi, Tabata, Toshiyuki, Huet, Karim, Goodman, Gary, Khapochkina, Nadya, Buyuklimanli, Temel
Published in ECS transactions (20.07.2018)
Published in ECS transactions (20.07.2018)
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Journal Article
Liquid Phase Epitaxy (LPE) Formation of Localized High Quality and Mobility Ge & SiGe by High Dose Ge-Implantation with Laser Melt Annealing for 10nm and 7nm Node CMOS Technology
Borland, John O, Sugitani, Michiro, Oesterlin, Peter, Johnson, Walt, Buyuklimanli, Temel, Hengstebeck, Robert, Kennon, Ethan, Jones, Kevin Scott, Joshi, Abhijeet
Published in ECS transactions (12.08.2014)
Published in ECS transactions (12.08.2014)
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Journal Article
Estimating lateral straggling of boron profiles ion implanted into crystalline silicon with a tilt angle of 0° using off-angle substrates
SUZUKI, Kunihiro, TANAHASHI, Katsuto, NAGAYAMA, Susumu, MAGEE, Charles W, BÜYÜKLIMANLI, Temel H, IWAMOTO, Eiji
Published in IEEE transactions on electron devices (01.05.2006)
Published in IEEE transactions on electron devices (01.05.2006)
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Journal Article
Characterization of Cu(In,Ga)(Te,S)2 thin films grown on stainless steel foil substrates
Karaca, Abdullah, Başol, Bülent M, Olgar, M Ali, Büyüklimanlı, Temel, Tomakin, Murat, Küçükömeroğlu, Tayfur, Bacaksız, Emin
Published in Journal of physics. D, Applied physics (11.05.2023)
Published in Journal of physics. D, Applied physics (11.05.2023)
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Journal Article
(Invited) Differential Hall Effect Metrology (DHEM) Sub-Nm Profiling and Its Application to Dopant Activation in n-Type Ge
Ramesh, Pranav, Saraswat, Krishna C., Joshi, Abhijeet, Basol, Bulent M, Wang, Larry, Buyuklimanli, Temel
Published in Meeting abstracts (Electrochemical Society) (01.05.2020)
Published in Meeting abstracts (Electrochemical Society) (01.05.2020)
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Journal Article
Investigation of differences between high and low efficiency CIGS solar cell structures using surface analytical techniques
Mount, G, Buyuklimanli, T, Michel, R, Moskito, J, Robie, S, Sharma, U, Wang, L
Published in 2010 35th IEEE Photovoltaic Specialists Conference (01.06.2010)
Published in 2010 35th IEEE Photovoltaic Specialists Conference (01.06.2010)
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Conference Proceeding
Accurate CIGS composition measurements using surface analytical techniques
Mount, G., Moskito, J., Sharma, U., Strossman, G., Wang, L., Schnabel, P., Buyuklimanli, T., Putyera, K.
Published in 2011 37th IEEE Photovoltaic Specialists Conference (01.06.2011)
Published in 2011 37th IEEE Photovoltaic Specialists Conference (01.06.2011)
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Conference Proceeding
High-resolution depth profiling of ultrashallow boron implants in silicon using high-resolution RBS
Kimura, Kenji, Oota, Yukitoshi, Nakajima, Kaoru, Büyüklimanli, Temel H.
Published in Current applied physics (01.02.2003)
Published in Current applied physics (01.02.2003)
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Journal Article
Boosting Ge-Epi P-Well Mobility & Crystal Quality with Si or Sn Implantation and Melt Annealing
Borland, John O, Joshi, Abhijeet, Basol, Bulent, Lee, Yao Jen, Kuroi, Takashi, Tabata, Toshiyuki, Huet, Karim, Goodman, Gary, Khapochkina, Nadya, Buyuklimanli, Temel
Published in Meeting abstracts (Electrochemical Society) (23.07.2018)
Published in Meeting abstracts (Electrochemical Society) (23.07.2018)
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Journal Article
Comparing RTA and Laser SPE & LPE Annealing of Ge-epi with Si, Sn & C Implantation for Well Mobility/Strain Engineering
Borland, John, Chaung, Shang-Shuin, Tseng, Tseung-Yuen, Joshi, Abhijeet, Basol, Bulent, Lee, Yao-Jen, Kuroi, Takashi, Goodman, Gary, Khapochkina, Nadya, Buyuklimanli, Temel
Published in 2019 19th International Workshop on Junction Technology (IWJT) (01.06.2019)
Published in 2019 19th International Workshop on Junction Technology (IWJT) (01.06.2019)
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Conference Proceeding
Boosting Ge-epi N-well Mobility with Sn Implantation and P-well Mobility with Cluster-C Implantation
Borland, John, Chaung, Shang-Shiun, Tseng, Tseung-Yuen, Lee, Yao-Jen, Joshi, Abhijeet, Basol, Bulent, Kuroi, Takashi, Goodman, Gary, Khapochkima, Nadya, Buyuklimanli, Temel
Published in 2018 22nd International Conference on Ion Implantation Technology (IIT) (01.09.2018)
Published in 2018 22nd International Conference on Ion Implantation Technology (IIT) (01.09.2018)
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Conference Proceeding