Direct Measurement of the Reaction Front in Chemically Amplified Photoresists
Lin, Eric K., Soles, Christopher L., Goldfarb, Dario L., Trinque, Brian C., Burns, Sean D., Jones, Ronald L., Lenhart, Joseph L., Angelopoulos, Marie, Willson, C. Grant, Satija, Sushil K., Wu, Wen-li
Published in Science (American Association for the Advancement of Science) (19.07.2002)
Published in Science (American Association for the Advancement of Science) (19.07.2002)
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Journal Article
Graded Spin-on Organic Bottom Antireflective Coating for High NA Immersion Lithography
Goldfarb, Dario L., Vyklicky, Libor, Burns, Sean D., Petrillo, Karen, Arnold, John, Lisi, Anthony, Pfeiffer, Dirk, Sanders, Daniel D., Allen, Robert D., Medeiros, David R., Owe-Yang, Dah Chung, Noda, Kazumi, Tachiban, Seiichiro, Shirai, Shozo
Published in Journal of Photopolymer Science and Technology (01.01.2008)
Published in Journal of Photopolymer Science and Technology (01.01.2008)
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Journal Article
Bilayer Resists for 193 nm Lithography: SSQ and POSS
Ito, Hiroshi, Truong, Hoa D., Burns, Sean D., Pfeiffer, Dirk, Medeiros, David R.
Published in Journal of Photopolymer Science and Technology (2006)
Published in Journal of Photopolymer Science and Technology (2006)
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Journal Article
Characterization and Lithographic Performance of Silsesquioxane 193 nm Bilayer Resists
Ito, Hiroshi, Truong, Hoa D, Burns, Sean D., Pfeiffer, Dirk, Huang, Wu-Song, Khojastech, Mahmoud M., Varanasi, P. Rao, Lercel, Mike
Published in Journal of Photopolymer Science and Technology (01.01.2005)
Published in Journal of Photopolymer Science and Technology (01.01.2005)
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Journal Article
Process Window Centering for 22 nm Lithography
Buengener, Ralf, Boye, Carol, Rhoads, Bryan N, Chong, Sang Y, Tejwani, Charu, Burns, Sean D, Stamper, Andrew D, Nafisi, Kourosh, Brodsky, Colin J, Fan, Susan S, Kini, Sumanth, Hahn, Roland
Published in IEEE transactions on semiconductor manufacturing (01.05.2011)
Published in IEEE transactions on semiconductor manufacturing (01.05.2011)
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Journal Article
Conference Proceeding
Mesoscale Monte Carlo simulation of photoresist processing
SCHMID, Gerard M, STEWART, Michael D, BURNS, Sean D, WILLSON, C. Grant
Published in Journal of the Electrochemical Society (01.02.2004)
Published in Journal of the Electrochemical Society (01.02.2004)
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Journal Article
The Photopolymer Science and Technology Award
Goldfarb, Dario L., Vylicky, Libor, Burns, Sean D., Petrillo, Karen, Arnold, John, Lisi, Anthony, Pfeiffer, Dirk, Sanders, Daniel P., Allen, Robert D., Medeiros, David R., Owe-Yang, Dah chung, Noda, Kazumi, Tachibana, Seiichiro, Shirai, Shozo
Published in Journal of Photopolymer Science and Technology (2009)
Published in Journal of Photopolymer Science and Technology (2009)
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Journal Article
ALTERNATING HARDMASKS FOR TIGHT-PITCH LINE FORMATION
Felix, Nelson M, Mignot, Yann A.M, Liu, Chi-Chun, Burns, Sean D, Sieg, Stuart A
Year of Publication 25.01.2024
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Year of Publication 25.01.2024
Patent
Alternating hardmasks for tight-pitch line formation
Felix, Nelson M, Liu, Chi-Chun, Burns, Sean D, Mignot, Yann A. M, Sieg, Stuart A
Year of Publication 21.03.2023
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Year of Publication 21.03.2023
Patent
Bilayer Resists for 193 nm Lithography
Ito, Hiroshi, D. Truong, Hoa, D. Burns, Sean, Pfeiffer, Dirk, R. Medeiros, David
Published in Journal of photopolymer science and technology (01.05.2006)
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Published in Journal of photopolymer science and technology (01.05.2006)
Journal Article
SELECTIVE GAS ETCHING FOR SELF-ALIGNED PATTERN TRANSFER
Xu, Yongan, Arnold, John Christopher, Burns, Sean D, Mignot, Yann Alain Marcel
Year of Publication 18.08.2022
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Year of Publication 18.08.2022
Patent
Process Window Centering for 22 nm lithography
Buengener, Ralf, Boye, C, Rhoads, B N, Chong, S Y, Tejwani, C, Burns, S D, Stamper, A D, Nafisi, K, Brodsky, C J, Fan, S S, Kini, S, Hahn, R
Published in 2010 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC) (01.07.2010)
Published in 2010 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC) (01.07.2010)
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Conference Proceeding
Self-aligned pattern formation for a semiconductor device
Clevenger, Lawrence A, Felix, Nelson M, Penny, Christopher J, Burns, Sean D, Saulnier, Nicole, Kanakasabapathy, Sivananda K
Year of Publication 09.05.2023
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Year of Publication 09.05.2023
Patent
Selective gas etching for self-aligned pattern transfer
Xu, Yongan, Arnold, John Christopher, Burns, Sean D, Mignot, Yann Alain Marcel
Year of Publication 12.04.2022
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Year of Publication 12.04.2022
Patent
ALTERNATING HARDMASKS FOR TIGHT-PITCH LINE FORMATION
Felix, Nelson M, Mignot, Yann A.M, Liu, Chi-Chun, Burns, Sean D, Sieg, Stuart A
Year of Publication 28.10.2021
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Year of Publication 28.10.2021
Patent