Monitoring process-induced focus errors using high-resolution flatness metrology
Morgenfeld, Bradley J., Brunner, Timothy A., Nummy, Karen, Stoll, Derek, Nan Jing, Hong Lin, Vukkadala, Pradeep, Herrera, Pedro, Ramkhalawon, Roshita, Sinha, Jaydeep
Published in 2015 26th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) (01.05.2015)
Published in 2015 26th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) (01.05.2015)
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Conference Proceeding
Scatterometry-based on-product focus measurement and monitoring
Hinnen, Paul, Wang, Vivien, Mardanpour, Hossein, Beltman, Jan, Rottenkolber, Erica, Leewis, Christian, Brunner, Timothy A., Wong, Cheuk W., Rawat, Pawan
Published in ASMC 2013 SEMI Advanced Semiconductor Manufacturing Conference (01.05.2013)
Published in ASMC 2013 SEMI Advanced Semiconductor Manufacturing Conference (01.05.2013)
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Conference Proceeding
Ion beams, thermal processes and lithographic challenges
Levinson, Harry J., Brunner, Timothy A.
Published in 2014 20th International Conference on Ion Implantation Technology (IIT) (01.06.2014)
Published in 2014 20th International Conference on Ion Implantation Technology (IIT) (01.06.2014)
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Conference Proceeding
Method for calculating non-correctable EUV blank flatness for blank dispositioning
Turley, Christina, Rankin, Jed H, Gabor, Allen H, Chen, Xuemei, Brunner, Timothy A
Year of Publication 04.02.2020
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Year of Publication 04.02.2020
Patent
METHOD FOR CALCULATING NON-CORRECTABLE EUV BLANK FLATNESS FOR BLANK DISPOSITIONING
RANKIN, Jed H, GABOR, Allen H, TURLEY, Christina, BRUNNER, Timothy A, CHEN, Xuemei
Year of Publication 14.03.2019
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Year of Publication 14.03.2019
Patent