Influence of anode roughness and buffer layer nature on organic solar cells performance
Dahou, F.Z., Cattin, L., Garnier, J., Ouerfelli, J., Morsli, M., Louarn, G., Bouteville, A., Khellil, A., Bernède, J.C.
Published in Thin solid films (31.08.2010)
Published in Thin solid films (31.08.2010)
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Journal Article
Towards anode with low indium content as effective anode in organic solar cells
Touihri, S., Cattin, L., Nguyen, D-T., Morsli, M., Louarn, G., Bouteville, A., V.Froger, Bernède, J.C.
Published in Applied surface science (15.01.2012)
Published in Applied surface science (15.01.2012)
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Journal Article
Residual stress gradient analysis by the GIXRD method on CVD tantalum thin films
Peng, J., Ji, V., Seiler, W., Tomescu, A., Levesque, A., Bouteville, A.
Published in Surface & coatings technology (24.01.2006)
Published in Surface & coatings technology (24.01.2006)
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Journal Article
Validation of a Rapid Thermal Processing model in steady-state
Logerais, P.O., Chapron, D., Garnier, J., Bouteville, A.
Published in Microelectronic engineering (01.11.2008)
Published in Microelectronic engineering (01.11.2008)
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Journal Article
Droplet dispersion calculations for ultrasonic spray pyrolysis depositions
Chapron, D, Girtan, M, Le Pommelec, J-Y, Bouteville, A
Published in Journal of Optoelectronics and Advanced Materials (01.04.2007)
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Published in Journal of Optoelectronics and Advanced Materials (01.04.2007)
Journal Article
Preparation and properties of SnO2:F thin films
Girtan, M, Boutevllle, A, Rusu, G G, Rusu, M
Published in Journal of Optoelectronics and Advanced Materials (01.02.2006)
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Published in Journal of Optoelectronics and Advanced Materials (01.02.2006)
Journal Article
Influence of the quartz window in a rapid thermal processing apparatus
Logerais, P O, Girtan, M, Bouteville, A
Published in Journal of Optoelectronics and Advanced Materials (01.02.2006)
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Published in Journal of Optoelectronics and Advanced Materials (01.02.2006)
Journal Article
Substrate thermal profiles in spray-CVD reactor
Girtan, M, Logerais, P O, Bouteville, A
Published in Journal of Optoelectronics and Advanced Materials (01.02.2006)
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Published in Journal of Optoelectronics and Advanced Materials (01.02.2006)
Journal Article
Thermodynamics of the Formation of TiN from TiCl4 ‐ NH 3 ‐ H 2 on a Patterned Oxidized Silicon Substrate
Bouteville, A., Imhoff, L., Remy, J. C.
Published in Journal of the Electrochemical Society (01.10.1996)
Published in Journal of the Electrochemical Society (01.10.1996)
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Journal Article
Composition and tribological characterization of chemically vapour-deposited TiN layer
Fouilland, L., Imhoff, L., Bouteville, A., Benayoun, S., Remy, J.C., Perrière, J., Morcrette, M.
Published in Surface & coatings technology (01.03.1998)
Published in Surface & coatings technology (01.03.1998)
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Journal Article
LPCVD of titanium disilicide: selectivity of growth
BOUTEVILLE, A, ROYER, A, REMY, J. C
Published in Journal of the Electrochemical Society (01.08.1987)
Published in Journal of the Electrochemical Society (01.08.1987)
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Journal Article
Selective RTLPCVD of TiSi2 without substrate consumption
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Conference Proceeding
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TiSi2 selective growth in a rapid thermal low pressure chemical vapor deposition system
BOUTEVILLE, A, REMY, J. C, ATTUYT, C
Published in Journal of the Electrochemical Society (01.08.1992)
Published in Journal of the Electrochemical Society (01.08.1992)
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Conference Proceeding
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