Dual-Workfunction Gate Engineering in a Corner Parasitics-Free Shallow-Trench-Isolation Complementary-Metal-Oxide-Semiconductor Technology
Schwalke, Udo, Füldner, Marc, Bothe, WalterZatsch, Janssen, DariuschHadawi, Schon, Peter
Published in Japanese Journal of Applied Physics (01.04.1999)
Published in Japanese Journal of Applied Physics (01.04.1999)
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