Etch modeling for model-based optical proximity correction for 65nm node
Gardin, Christian, Belledent, Jérôme, Trouiller, Yorick, Borjon, Amandine, Couderc, Christophe, Foussadier, Franck, Yesilada, Emek, Urbani, Jean-Christophe, Sundermann, Frank, Rody, Yves, Saied, Mazen, Planchot, Jonathan, Robert, Frederic
Published in Microelectronic engineering (01.05.2007)
Published in Microelectronic engineering (01.05.2007)
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Journal Article
Etch modeling for model-based optical proximity correction for 65 nm node
Gardin, Christian, Belledent, Jérôme, Trouiller, Yorick, Borjon, Amandine, Couderc, Christophe, Foussadier, Franck, Yesilada, Emek, Urbani, Jean-Christophe, Sundermann, Frank, Rody, Yves, Saied, Mazen, Planchot, Jonathan, Robert, Frederic
Published in Microelectronic engineering (01.05.2007)
Published in Microelectronic engineering (01.05.2007)
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Journal Article
Conference Proceeding
Analysis of the diffraction pattern for optimal assist feature placement
Borjon, Amandine, Belledent, Jérôme, Trouiller, Yorick, Gardin, Christian, Couderc, Christophe, Rody, Yves, Sundermann, Frank, Urbani, Jean-Christophe, Foussadier, Franck, Planchot, Jonathan, Yesilada, Emek, Montgomery, Patrick, Willkinson, Bill, Saied, Mazen, Martinelli, Catherine, Kerrien, Gurwan, Cam, Laurent Le, Vautrin, Florent, Robert, Frédéric, Schiavone, Patrick
Published in Microelectronic engineering (01.05.2007)
Published in Microelectronic engineering (01.05.2007)
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Journal Article
Conference Proceeding
Critical failure ORC: Improving model accuracy through enhanced model generation
Borjon, Amandine, Belledent, Jérôme, Trouiller, Yorick, Patterson, Kyle, Lucas, Kevin, Gardin, Christian, Couderc, Christophe, Rody, Yves, Sundermann, Frank, Urbani, Jean-Christophe, Baron, Stanislas, Foussadier, Frank, Schiavone, Patrick
Published in Microelectronic engineering (01.04.2006)
Published in Microelectronic engineering (01.04.2006)
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Journal Article
Conference Proceeding