Reactive ion etching of 6H-SiC in an ECR plasma of CF4-O2 mixtures using both Ni and Al masks
Syrkin, Alexander L., Bluet, Jean Marie, Camassel, Jean, Bonnot, Roger
Published in Materials science & engineering. B, Solid-state materials for advanced technology (01.04.1997)
Published in Materials science & engineering. B, Solid-state materials for advanced technology (01.04.1997)
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Thermal model of thin film anemometer
Giani, A., Mailly, F., Bonnot, R., Pascal-Delannoy, F., Foucaran, A., Boyer, A.
Published in Microelectronics (01.08.2002)
Published in Microelectronics (01.08.2002)
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Journal Article