Study of the cross contamination effect on post CMP in situ cleaning process
Kim, Hong Jin, Bohra, Girish, Yang, Hyucksoo, Ahn, Si-Gyung, Qin, Liqiao, Koli, Dinesh
Published in Microelectronic engineering (25.03.2015)
Published in Microelectronic engineering (25.03.2015)
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Journal Article
(Invited) Factors Impacting Threshold Voltage in Advanced CMOS Integration: Gate Last (FINFET) vs. Gate First (FDSOI)
Triyoso, Dina, Carter, Rick, Kluth, Jon, Luning, Scott, Child, Amy, Wahl, Jeremy, Mulfinger, Bob, Punchihewa, Kasun, Kumar, Anil, Kang, Laegu, Sporer, Ryan, Chen, Xiaobo, Straub, Sherry, Bohra, Girish, Patil, Suraj, Zhang, Xing, Chen, Alex, Togo, Mitsuhiro, Pal, Rohit
Published in ECS transactions (08.09.2015)
Published in ECS transactions (08.09.2015)
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Journal Article
(Invited) Factors Impacting Threshold Voltage in Advanced CMOS Integration: Gate Last (FINFET) vs. Gate First (FDSOI)
Triyoso, Dina, Carter, Rick, Kluth, Jon, Luning, Scott, Child, Amy, Wahl, Jeremy, Mulfinger, Bob, Punchihewa, Kasun, Kumar, Anil, Kang, Laegu, Sporer, Ryan, Chen, Xiaobo, Straub, Sherry, Bohra, Girish, Patil, Suraj, Zhang, Xing, Chen, Alex, Togo, Mitsuhiro, Pal, Rohit
Published in Meeting abstracts (Electrochemical Society) (07.07.2015)
Published in Meeting abstracts (Electrochemical Society) (07.07.2015)
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Journal Article