An overview of radiation-induced interface traps in MOS structures
Oldham, T R, McLean, F B, Jr, H E Boesch, McGarrity, J M
Published in Semiconductor science and technology (01.12.1989)
Published in Semiconductor science and technology (01.12.1989)
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Journal Article
Reversibility of trapped hole annealing
Lelis, A.J., Boesch, H.E., Oldham, T.R., McLean, F.B.
Published in IEEE transactions on nuclear science (01.12.1988)
Published in IEEE transactions on nuclear science (01.12.1988)
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Journal Article
The nature of the trapped hole annealing process
Lelis, A.J., Oldham, T.R., Boesch, H.E., McLean, F.B.
Published in IEEE transactions on nuclear science (01.12.1989)
Published in IEEE transactions on nuclear science (01.12.1989)
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Journal Article
Time-dependent radiation-induced charge effects in wafer-bonded SOI buried oxides
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Journal Article
Conference Proceeding
Post-Irradiation Effects in Field-Oxide Isolation Structures
Oldham, T. R., Lelis, A. J., Boesch, H. E., Benedetto, J. M., McLean, F. B., McGarrity, J. M.
Published in IEEE transactions on nuclear science (1987)
Published in IEEE transactions on nuclear science (1987)
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Journal Article
Time-dependent hole and electron trapping effects in SIMOX buried oxides
Boesch, H.E., Taylor, T.L., Hite, L.R., Bailey, W.E.
Published in IEEE transactions on nuclear science (01.12.1990)
Published in IEEE transactions on nuclear science (01.12.1990)
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Journal Article
Thermal annealing of trapped holes in SIMOX buried oxides
Pennise, C.A., Boesch, H.E.
Published in IEEE Transactions on Nuclear Science (Institute of Electrical and Electronics Engineers); (United States) (01.12.1991)
Published in IEEE Transactions on Nuclear Science (Institute of Electrical and Electronics Engineers); (United States) (01.12.1991)
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Journal Article
Conference Proceeding
Photoconduction measurements of the charge trapping and transport in bond-and-etch-back buried oxides
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Journal Article
Conference Proceeding
Saturation of Threshold Voltage Shift in MOSFET's at High Total Dose
Boesch, H. E., McLean, F. B., Benedetto, J. M., McGarrity, J. M., Bailey, W. E.
Published in IEEE transactions on nuclear science (01.12.1986)
Published in IEEE transactions on nuclear science (01.12.1986)
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Journal Article
Dose and energy dependence of interface trap formation in cobalt-60 and X-ray environments
Benedetto, J.M., Boesch, H.E., McLean, F.B.
Published in IEEE transactions on nuclear science (01.12.1988)
Published in IEEE transactions on nuclear science (01.12.1988)
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Journal Article
Charge trapping and transport properties of SIMOX buried oxides with a supplemental oxygen implant
Boesch, H.E., Taylor, T.L., Krull, W.A.
Published in IEEE Transactions on Nuclear Science (Institute of Electrical and Electronics Engineers); (United States) (01.12.1993)
Published in IEEE Transactions on Nuclear Science (Institute of Electrical and Electronics Engineers); (United States) (01.12.1993)
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Journal Article
Conference Proceeding
Measurement and modeling of radiation response of multilayer BESOI buried insulators
Boesch, H.E., Pennise, C.A.
Published in IEEE Transactions on Nuclear Science (Institute of Electrical and Electronics Engineers); (United States) (01.12.1994)
Published in IEEE Transactions on Nuclear Science (Institute of Electrical and Electronics Engineers); (United States) (01.12.1994)
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Journal Article
Conference Proceeding
Charge buildup at high dose and low fields in SIMOX buried oxides
Boesch, H.E., Taylor, T.L., Brown, G.A.
Published in IEEE Transactions on Nuclear Science (Institute of Electrical and Electronics Engineers); (United States) (01.12.1991)
Published in IEEE Transactions on Nuclear Science (Institute of Electrical and Electronics Engineers); (United States) (01.12.1991)
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Journal Article
Conference Proceeding
Radiation-induced charge effects in buried oxides with different processing treatments
Pennise, C.A., Boesch, H.E., Goetz, G., McKitterick, J.B.
Published in IEEE transactions on nuclear science (01.12.1993)
Published in IEEE transactions on nuclear science (01.12.1993)
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Journal Article
Conference Proceeding
Hole transport in SiO2 and reoxidized nitrided SiO2 gate insulators at low temperature
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Conference Proceeding
Journal Article