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Year of Publication 06.12.2022
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Year of Publication 06.12.2022
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Year of Publication 28.01.2021
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Year of Publication 28.01.2021
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Year of Publication 08.11.2022
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Year of Publication 08.11.2022
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EX SITU COATING OF CHAMBER COMPONENTS FOR SEMICONDUCTOR PROCESSING
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Year of Publication 10.06.2022
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Year of Publication 10.06.2022
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반도체 프로세싱을 위한 챔버 컴포넌트들의 엑스시츄 코팅
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Year of Publication 28.07.2020
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Year of Publication 28.07.2020
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IMPROVED PEDESTALS FOR SUBSTRATE PROCESSING SYSTEMS
RAO, Shreesha Yogish, BIRRU, Krishna, KHO, Leonard, KOTHAPALLI, Vijay, GULABAL, Vinayakaraddy, CHEN, Xitong
Year of Publication 11.01.2024
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Year of Publication 11.01.2024
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LAYER UNIFORMITY IMPROVEMENT OF DEPOSITION-INHIBITION-DEPOSITION PROCESSES
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Year of Publication 07.09.2023
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Year of Publication 07.09.2023
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CLEANING SYSTEM FOR REMOVING DEPOSITS FROM PUMP IN AN EXHAUST OF A SUBSTRATE PROCESSING SYSTEM
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Year of Publication 19.08.2021
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Year of Publication 19.08.2021
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FEATURE FILL WITH NUCLEATION INHIBITION
BIRRU, Krishna, KHARE, Rohit, LIU, Gang L, CHANDRASHEKAR, Anand, KHO, Leonard Wai Fung
Year of Publication 20.04.2023
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Year of Publication 20.04.2023
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REACTANT GAS PULSE DELIVERY
SINGH, Sumit Subhash, BIRRU, Krishna, SUN, Yong, ZHANG, Xing, BOWES, Michael, KHO, Leonard Wai Fung, CHANDRASHEKAR, Anand
Year of Publication 27.04.2023
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Year of Publication 27.04.2023
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CLEANING SYSTEM FOR REMOVING DEPOSITS FROM PUMP IN AN EXHAUST OF A SUBSTRATE PROCESSING SYSTEM
BIRRU, Krishna, KHO, Leonard, LIU, Gang, CHANDRASHEKAR, Anand, HSU, Gishun
Year of Publication 19.12.2019
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Year of Publication 19.12.2019
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FEATURE FILL WITH NUCLEATION INHIBITION
BIRRU, Krishna, KHARE, Rohit, LIU, Gang, CHANDRASHEKAR, Anand, KHO, Leonard Wai Fung
Year of Publication 30.09.2021
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Year of Publication 30.09.2021
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REACTANT GAS PULSE DELIVERY
SINGH, Sumit Subhash, BIRRU, Krishna, SUN, Yong, ZHANG, Xing, BOWES, Michael, KHO, Leonard Wai Fung, CHANDRASHEKAR, Anand
Year of Publication 10.09.2021
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Year of Publication 10.09.2021
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EX SITU COATING OF CHAMBER COMPONENTS FOR SEMICONDUCTOR PROCESSING
LAI, Fengyuan, BAMFORD, Thadeous, KAUSHAL, Tony, BRENINGER, Andrew H, HOHN, Geoffrey, SHANBHAG, Damodar Rajaram, SCHLOSSER, William, HSU, Chen-Hua, KHARE, Rohit, KHO, Leonard Wai Fung, BAILEY, Curtis Warren, YUAN, Guangbi, BIRRU, Krishna, GONG, Bo, CHANDRASHEKAR, Anand, LIU, Gang, QIU, Huatan
Year of Publication 05.01.2023
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Year of Publication 05.01.2023
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EX SITU COATING OF CHAMBER COMPONENTS FOR SEMICONDUCTOR PROCESSING
LAI, Fengyuan, BAMFORD, Thadeous, KAUSHAL, Tony, BRENINGER, Andrew H, HOHN, Geoffrey, SHANBHAG, Damodar Rajaram, SCHLOSSER, William, HSU, Chen-Hua, KHARE, Rohit, KHO, Leonard Wai Fung, BAILEY, Curtis Warren, YUAN, Guangbi, BIRRU, Krishna, GONG, Bo, CHANDRASHEKAR, Anand, LIU, Gang, QIU, Huatan
Year of Publication 01.09.2022
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Year of Publication 01.09.2022
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