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Selective Deposition of Dielectrics: Limits and Advantages of Alkanethiol Blocking Agents on Metal–Dielectric Patterns
by
Minaye Hashemi, Fatemeh Sadat
,
Birchansky
,
Bradlee R
,
Bent, Stacey F
Published in
ACS applied materials & interfaces
(07.12.2016)
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Format
Journal Article
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Subject Area
engineering
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Topic
alkanethiols
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area selective ald
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materials science
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materials science, multidisciplinary
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metal-dielectric pattern
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nanoscience & nanotechnology
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English
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American Chemical Society
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PubMed
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