Method for determining deformation, method of aligning to a substrate, method of metrology of a substrate, method of correcting a lithographic process, computer program and computer program product
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Year of Publication 21.08.2019
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Year of Publication 21.08.2019
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Lithographic apparatus and device manufacturing method to determine improved absolute position of exposure fields using mark structures
BIJNEN FRANCISCUS GODEFRIDUS CASPER, VAN KEMENADE MARC, WARNAAR PATRICK, TOLSMA HOITE PIETER THEODOOR, ROIJERS JOZEF CORNELIS ANTONIUS
Year of Publication 09.12.2014
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Year of Publication 09.12.2014
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ALIGNMENT METHOD
BIJNEN FRANCISCUS GODEFRIDUS CASPER, HULSEBOS EDO MARIA, MATHIJSSEN SIMON GIJSBERT JOSEPHUS, DEMERGIS VASSILI
Year of Publication 16.04.2019
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Year of Publication 16.04.2019
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Method for determining deformation
TINNEMANS, PATRICIUS ALOYSIUS JACOBUS, BIJNEN, FRANCISCUS GODEFRIDUS CASPER, HULSEBOS, EDO MARIA
Year of Publication 01.02.2019
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Year of Publication 01.02.2019
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Method of optimising measurement data from a sensor system and method for monitoring condition of semiconductor manufacturing process
COX, MATTHIJS, ERDAMAR, AHMET KORAY, CEKLI, HAKKI ERGUN, BIJNEN, FRANCISCUS GODEFRIDUS CASPER, HULSEBOS, EDO MARIA, VU, TRAN THANH THUY, VAN DE VEN, WENDY JOHANNA MARTINA, TINNEMANS, PATRICIUS ALOYSIUS JACOBUS, VERHEES, LOEK JOHANNES PETRUS, ROELOFS, WILLEM SEINE CHRISTIAN, BRINKHOF, RALPH, MEGENS, HENRICUS JOHANNES LAMBERTUS, VAN T WESTEINDE, MAAIKE, YAGUBIZADE, HADI, GOOSEN, MAIKEL ROBERT, RIJPSTRA, MANOUK, KOU, WEITIAN
Year of Publication 11.08.2022
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Year of Publication 11.08.2022
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Alignment System and Alignment Marks for Use Therewith
BIJNEN FRANCISCUS GODEFRIDUS CASPER, HULSEBOS EDO MARIA, WARNAAR PATRICK
Year of Publication 26.08.2010
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Year of Publication 26.08.2010
Patent