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Published in IEEE electron device letters (01.10.2010)
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Silicon nitride thin films deposited by electron cyclotron resonance plasma enhanced chemical vapor deposition for micromechanical system applications
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Published in Thin solid films (01.09.2008)
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Integration of MOSFETs with SiGe dots as stressor material
Nanver, L.K., Jovanović, V., Biasotto, C., Moers, J., Grützmacher, D., Zhang, J.J., Hrauda, N., Stoffel, M., Pezzoli, F., Schmidt, O.G., Miglio, L., Kosina, H., Marzegalli, A., Vastola, G., Mussler, G., Stangl, J., Bauer, G., van der Cingel, J., Bonera, E.
Published in Solid-state electronics (01.06.2011)
Published in Solid-state electronics (01.06.2011)
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Ultra-low Leakage IGZO-TFTs with Raised Source/Drain for Vt > 0 V and Ion > 30 µA/µm
Subhechha, S., Rassoul, N., Belmonte, A., Hody, H., Dekkers, H., van Setten, M. J., Chasin, A., Sharifi, S.H., Sutar, S., Magnarin, L., Celano, U., Puliyalil, H., Kundu, S., Pak, M., Teugels, L., Tsvetanova, D., Bazzazian, N., Vandersmissen, K., Biasotto, C., Batuk, D., Geypen, J., Heijlen, J., Delhougne, R., Kar, G. S.
Published in 2022 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits) (12.06.2022)
Published in 2022 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits) (12.06.2022)
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Conference Proceeding
MOSFETs on self-assembled SiGe dots with strain-enhanced mobility
Jovanović, V, Biasotto, C, Nanver, L K, Moers, J, Grützmacher, D, Gerharz, J, Mussler, G, van der Cingel, J, Zhang, J, Bauer, G, Schmidt, O G, Miglio, L
Published in 2010 10th IEEE International Conference on Solid-State and Integrated Circuit Technology (01.11.2010)
Published in 2010 10th IEEE International Conference on Solid-State and Integrated Circuit Technology (01.11.2010)
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Conference Proceeding
Laser Annealing of Self-Aligned As + Implants in Contact Windows for Ultrashallow Junction Formation
Biasotto, Cleber, Gonda, Viktor, Nanver, Lis K., Van der Cingel, J., Jovanović, V.
Published in ECS transactions (04.09.2009)
Published in ECS transactions (04.09.2009)
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Application of laser annealing in the EU FP6 project D-DotFET
Nanver, L. K., Jovanovic, V., Biasotto, C., van der Cingel, J., Milosavljevic, S.
Published in 2009 17th International Conference on Advanced Thermal Processing of Semiconductors (01.09.2009)
Published in 2009 17th International Conference on Advanced Thermal Processing of Semiconductors (01.09.2009)
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Conference Proceeding
Strain determination in the Si channel above a single SiGe island inside a field effect transistor using nanobeam x-ray diffraction
Hrauda, N, Zhang, J. J, Wintersberger, E, Etzelstorfer, T, Stangl, J, Carbone, D, Biasotto, C, Jovanovic, V, Nanver, L. K, Moers, J, Grützmacher, D, Bauer, G
Year of Publication 17.11.2010
Year of Publication 17.11.2010
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Journal Article
Integration of laser-annealed junctions in a low-temperature high-k metal-gate MISFET
Biasotto, C., Jovanovic, V., Gonda, V., van der Cingel, J., Milosavljevic, S., Nanver, L.K.
Published in 2009 10th International Conference on Ultimate Integration of Silicon (01.03.2009)
Published in 2009 10th International Conference on Ultimate Integration of Silicon (01.03.2009)
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Conference Proceeding
Strain determination in the Si channel above a single SiGe island inside a field effect transistor using nanobeam x-ray diffraction
Hrauda, N, Zhang, J J, Wintersberger, E, Etzelstorfer, T, Stangl, J, Carbone, D, Biasotto, C, Jovanovic, V, Nanver, L K, Moers, J, Grützmacher, D, Bauer, G
Published in arXiv.org (17.11.2010)
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Published in arXiv.org (17.11.2010)
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