Application of scatterometric porosimetry to characterize porous ultra low-k patterned layers
Licitra, C., Bouyssou, R., El Kodadi, M., Haberfehlner, G., Chevolleau, T., Hazart, J., Virot, L., Besacier, M., Schiavone, P., Bertin, F.
Published in Thin solid films (28.02.2011)
Published in Thin solid films (28.02.2011)
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Resist trimming etch process control using dynamic scatterometry
El kodadi, M., Soulan, S., Besacier, M., Schiavone, P.
Published in Microelectronic engineering (01.04.2009)
Published in Microelectronic engineering (01.04.2009)
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Multi-branch neural network for hybrid metrology improvement
Digraci, Paul, Besacier, Maxime, Gergaud, Patrice, Rademaker, Guido, Rêche, Jérôme
Published in Small (Weinheim an der Bergstrasse, Germany) (26.05.2022)
Published in Small (Weinheim an der Bergstrasse, Germany) (26.05.2022)
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Etching process scalability and challenges for ULK materials
Chevolleau, T, Posseme, N, David, T, Bouyssou, R, Ducote, J, Bailly, F, Darnon, M, El Kodadi, M, Besacier, M, Licitra, C, Guillermet, M, Ostrovsky, A, Verove, C, Joubert, O
Published in 2010 IEEE International Interconnect Technology Conference (01.06.2010)
Published in 2010 IEEE International Interconnect Technology Conference (01.06.2010)
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Hybrid Si-SiC fast switching cell modelling and characterisation including parasitic environment description by PEEC method
Besacier, M., Coyaud, M., Schanen, J.L., Roudet, J., Rivet, B.
Published in 2002 IEEE 33rd Annual IEEE Power Electronics Specialists Conference. Proceedings (Cat. No.02CH37289) (2002)
Published in 2002 IEEE 33rd Annual IEEE Power Electronics Specialists Conference. Proceedings (Cat. No.02CH37289) (2002)
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Development of Porosimetry Techniques for the Characterization of Plasma-Treated Porous Ultra Low-k Materials
Licitra, Christophe, Chevolleau, Thierry, Bouyssou, Regis, El Kodadi, Mohamed, Haberfehlner, Georg, Hazart, Jerome, Virot, Leopold, Besacier, Maxime, Posseme, Nicolas, Darnon, Maxime, Hurand, Romain, Schiavone, Patrick, Bertin, Francois
Published in ECS transactions (01.01.2011)
Published in ECS transactions (01.01.2011)
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Scatterometric Porosimetry for porous low-k patterns characterization
Hurand, R., Bouyssou, R., Darnon, M., Tiphine, C., Licitra, C., El-kodadi, M., Chevolleau, T., David, T., Posseme, N., Besacier, M., Schiavone, P., Bailly, F., Joubert, O., Verove, C.
Published in 2011 IEEE International Interconnect Technology Conference (01.05.2011)
Published in 2011 IEEE International Interconnect Technology Conference (01.05.2011)
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Conference Proceeding
3D rigorous simulation of EUV defective masks using modal method by Fourier expansion
Smaali, R., Besacier, M., Granet, G., Schiavone, P.
Published in Digest of Papers Microprocesses and Nanotechnology 2005 (2005)
Published in Digest of Papers Microprocesses and Nanotechnology 2005 (2005)
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