Effects of Substrate and Annealing Conditions on the Ferroelectric Properties of Non-Doped HfO2 Deposited by RF Plasma Sputter
Lim, Seokwon, Ahn, Yeonghwan, Beomho Won, Lee, Suwan, Park, Hayoung, Kumar, Mohit, Seo, Hyungtak
Published in Nanomaterials (Basel, Switzerland) (01.09.2024)
Published in Nanomaterials (Basel, Switzerland) (01.09.2024)
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Journal Article
Effects of Substrate and Annealing Conditions on the Ferroelectric Properties of Non-Doped HfO 2 Deposited by RF Plasma Sputter
Lim, Seokwon, Ahn, Yeonghwan, Won, Beomho, Lee, Suwan, Park, Hayoung, Kumar, Mohit, Seo, Hyungtak
Published in Nanomaterials (Basel, Switzerland) (25.08.2024)
Get full text
Published in Nanomaterials (Basel, Switzerland) (25.08.2024)
Journal Article