Imaging the Three-Dimensional Conductive Channel in Filamentary-Based Oxide Resistive Switching Memory
Celano, Umberto, Goux, Ludovic, Degraeve, Robin, Fantini, Andrea, Richard, Olivier, Bender, Hugo, Jurczak, Malgorzata, Vandervorst, Wilfried
Published in Nano letters (09.12.2015)
Published in Nano letters (09.12.2015)
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Journal Article
Three-Dimensional Observation of the Conductive Filament in Nanoscaled Resistive Memory Devices
Celano, Umberto, Goux, Ludovic, Belmonte, Attilio, Opsomer, Karl, Franquet, Alexis, Schulze, Andreas, Detavernier, Christophe, Richard, Olivier, Bender, Hugo, Jurczak, Malgorzata, Vandervorst, Wilfried
Published in Nano letters (14.05.2014)
Published in Nano letters (14.05.2014)
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Journal Article
Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
Groven, Benjamin, Heyne, Markus, Nalin Mehta, Ankit, Bender, Hugo, Nuytten, Thomas, Meersschaut, Johan, Conard, Thierry, Verdonck, Patrick, Van Elshocht, Sven, Vandervorst, Wilfried, De Gendt, Stefan, Heyns, Marc, Radu, Iuliana, Caymax, Matty, Delabie, Annelies
Published in Chemistry of materials (11.04.2017)
Published in Chemistry of materials (11.04.2017)
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Journal Article
Two-Dimensional Crystal Grain Size Tuning in WS2 Atomic Layer Deposition: An Insight in the Nucleation Mechanism
Groven, Benjamin, Nalin Mehta, Ankit, Bender, Hugo, Meersschaut, Johan, Nuytten, Thomas, Verdonck, Patrick, Conard, Thierry, Smets, Quentin, Schram, Tom, Schoenaers, Ben, Stesmans, Andre, Afanasʼev, Valeri, Vandervorst, Wilfried, Heyns, Marc, Caymax, Matty, Radu, Iuliana, Delabie, Annelies
Published in Chemistry of materials (13.11.2018)
Published in Chemistry of materials (13.11.2018)
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Journal Article
Site Selective Integration of III–V Materials on Si for Nanoscale Logic and Photonic Devices
Paladugu, Mohanchand, Merckling, Clement, Loo, Roger, Richard, Olivier, Bender, Hugo, Dekoster, Johan, Vandervorst, Wilfried, Caymax, Matty, Heyns, Marc
Published in Crystal growth & design (03.10.2012)
Published in Crystal growth & design (03.10.2012)
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Journal Article
Influence of Carbon Alloying on the Thermal Stability and Resistive Switching Behavior of Copper-Telluride Based CBRAM Cells
Devulder, Wouter, Opsomer, Karl, Seidel, Felix, Belmonte, Attilio, Muller, Robert, De Schutter, Bob, Bender, Hugo, Vandervorst, Wilfried, Van Elshocht, Sven, Jurczak, Malgorzata, Goux, Ludovic, Detavernier, Christophe
Published in ACS applied materials & interfaces (14.08.2013)
Published in ACS applied materials & interfaces (14.08.2013)
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Journal Article
Chemical vapor deposition of Si:C and Si:C:P films—Evaluation of material quality as a function of C content, carrier gas and doping
Dhayalan, Sathish Kumar, Loo, Roger, Hikavyy, Andriy, Rosseel, Erik, Bender, Hugo, Richard, Olivier, Vandervorst, Wilfried
Published in Journal of crystal growth (15.09.2015)
Published in Journal of crystal growth (15.09.2015)
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Journal Article
Diffraction studies for stoichiometry effects in BaTiO3 grown by molecular beam epitaxy on Ge(001)
Hsu, Min-Hsiang Mark, Merckling, Clement, El Kazzi, Salim, Pantouvaki, Marianna, Richard, Oliver, Bender, Hugo, Meersschaut, Johan, Van Campenhout, Joris, Absil, Philippe, Van Thourhout, Dries
Published in Journal of applied physics (14.12.2016)
Published in Journal of applied physics (14.12.2016)
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Journal Article
Ferroelectricity in Si-Doped Hafnia: Probing Challenges in Absence of Screening Charges
Celano, Umberto, Gomez, Andres, Piedimonte, Paola, Neumayer, Sabine, Collins, Liam, Popovici, Mihaela, Florent, Karine, McMitchell, Sean R. C., Favia, Paola, Drijbooms, Chris, Bender, Hugo, Paredis, Kristof, Di Piazza, Luca, Jesse, Stephen, Van Houdt, Jan, van der Heide, Paul
Published in Nanomaterials (Basel, Switzerland) (11.08.2020)
Published in Nanomaterials (Basel, Switzerland) (11.08.2020)
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Journal Article
Intragrain defects in polycrystalline silicon layers grown by aluminum-induced crystallization and epitaxy for thin-film solar cells
Van Gestel, Dries, Gordon, Ivan, Bender, Hugo, Saurel, Damien, Vanacken, Johan, Beaucarne, Guy, Poortmans, Jef
Published in Journal of applied physics (01.06.2009)
Published in Journal of applied physics (01.06.2009)
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Journal Article
Selective Area Growth of InP and Defect Elimination on Si (001) Substrates
Wang, Gang, Leys, Maarten, Loo, Roger, Richard, Olivier, Bender, Hugo, Brammertz, Guy, Waldron, Niamh, Wang, Wei-E, Dekoster, Johan, Caymax, Matty, Seefeldt, Marc, Heyns, Marc
Published in Journal of the Electrochemical Society (2011)
Published in Journal of the Electrochemical Society (2011)
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Journal Article
Electrically active defects at AlN/Si interface studied by DLTS and ESR
Simoen, Eddy, Visalli, Domenica, Van Hove, Marleen, Leys, Maarten, Favia, Paola, Bender, Hugo, Borghs, Gustaaf, Nguyen, Ahn Puc Duc, Stesmans, Andre
Published in Physica status solidi. A, Applications and materials science (01.10.2012)
Published in Physica status solidi. A, Applications and materials science (01.10.2012)
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Journal Article
Growth techniques to reduce V-defect density in GaN and AlGaN layers grown on 200 mm Si (111) substrate
Liang, Hu, Saripalli, Yoga, Kandaswamy, Prem Kumar, Carlson, Eric Porter, Favia, Paola, Richard, Olivier, Bender, Hugo, Zhao, Ming, Thapa, Sarad Bahadur, Vancoille, Eric
Published in Physica status solidi. C (01.02.2014)
Published in Physica status solidi. C (01.02.2014)
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Journal Article
The implant-free quantum well field-effect transistor: Harnessing the power of heterostructures
Hellings, Geert, Hikavyy, Andriy, Mitard, Jerome, Witters, Liesbeth, Benbakhti, Brahim, Alian, AliReza, Waldron, Niamh, Bender, Hugo, Eneman, Geert, Krom, Raymond, Schulze, Andreas, Vandervorst, Wilfried, Loo, Roger, Heyns, Marc, Meuris, Marc, Hoffmann, Thomas, De Meyer, Kristin
Published in Thin solid films (01.02.2012)
Published in Thin solid films (01.02.2012)
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Journal Article
Conference Proceeding
Metrology for Monitoring and Detecting Process Issues in a TSV Module
Philipsen, Harold, Vandersmissen, Kevin, Cockburn, Andrew, Erickson, David, Drijbooms, Chris, Moussa, Alain, Bender, Hugo, Struyf, Herbert
Published in ECS journal of solid state science and technology (01.01.2014)
Published in ECS journal of solid state science and technology (01.01.2014)
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Journal Article
The influence of post-etch InGaAs fin profile on electrical performance
Ivanov, Tsvetan, Pourghaderi, Mohammad Ali, Lin, Dennis, Yu, Jen-Kan, Tan, Samantha, Kimura, Yoshie, Hellin, David, Geypen, Jeffrey, Bender, Hugo, Vertommen, Johan, Kamarthy, Gowri, Collaert, Nadine, Marks, Jef, Vahedi, Vahid, Arghavani, Reza, Thean, Aaron
Published in Japanese Journal of Applied Physics (01.04.2014)
Published in Japanese Journal of Applied Physics (01.04.2014)
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Journal Article
Biaxial and Uniaxial Compressive Stress Implemented in Ge(Sn) pMOSFET Channels by Advanced Reduced Pressure Chemical Vapor Deposition Developments
Vincent, Benjamin, Gencarelli, Federica, Lin, Denis, Nyns, Laura, Richard, Olivier, Bender, Hugo, Douhard, Bastien, Moussa, Alain, Merckling, Clement, Witters, Liesbeth, Vandervorst, Wilfried, Loo, Roger, Caymax, Matty, Heyns, Marc
Published in ECS transactions (04.10.2011)
Published in ECS transactions (04.10.2011)
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Journal Article
W versus Co--Al as Gate Fill-Metal for Aggressively Scaled Replacement High-$k$/Metal Gate Devices for (Sub-)22 nm Technology Nodes
Veloso, Anabela, Chew, Soon Aik, Schram, Tom, Dekkers, Harold, Ammel, Annemie Van, Witters, Thomas, Tielens, Hilde, Heylen, Nancy, Devriendt, Katia, Sebaai, Farid, Brus, Stephan, Ragnarsson, Lars-$Å$ke, Pantisano, Luigi, Eneman, Geert, Carbonell, Laure, Richard, Olivier, Favia, Paola, Geypen, Jef, Bender, Hugo, Higuchi, Yuichi, Phatak, Anup, Thean, Aaron, Horiguchi, Naoto
Published in Japanese Journal of Applied Physics (01.04.2013)
Published in Japanese Journal of Applied Physics (01.04.2013)
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Journal Article
Dielectric reliability of 70nm pitch air-gap interconnect structures
Pantouvaki, Marianna, Sebaai, Farid, Kellens, Kristof, Goossens, Danny, Vereecke, Bart, Versluijs, Janko, Van Besien, Els, Caluwaerts, Rudy, Marrant, Koen, Bender, Hugo, Moussa, Alain, Struyf, Herbert, Beyer, Gerald P.
Published in Microelectronic engineering (01.07.2011)
Published in Microelectronic engineering (01.07.2011)
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