Bare wafer analysis for wet cleaning efficiency - The impact of classification and sensitivity
Wendt, Kay, Wilbers, Fabian, Ruth, Jochen, Lorant, Christophe, Holsteyns, Frank, Newby, John, Bast, Gerhard, Sundar, Vignesh
Published in 2018 29th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) (01.04.2018)
Published in 2018 29th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) (01.04.2018)
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Conference Proceeding
Using the low frequency component of the background signal for SiGe and Ge growth monitoring
Halder, Sandip, Schulze, Andreas, Leray, Philippe, Caymax, Matty, Bast, Gerhard, Simpson, Gavin, Ulea, Neli, Polli, Marco
Published in 2015 26th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) (01.05.2015)
Published in 2015 26th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) (01.05.2015)
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Conference Proceeding
Evaluation of the Si 0.8 Ge 0.2 -on-Si Epitaxial Quality by Inline Surface Light Scattering: A Case Study on the Impact of Interfacial Oxygen
Wostyn, Kurt, Kenis, Karine, Rondas, Dirk, Loo, Roger, Hikavyy, Andriy Yakovitch, Dhayalan, Sathish, Douhard, Bastien, Mertens, Paul W., Holsteyns, Frank, De Gendt, Stefan, Simpson, Gavin, Bast, Gerhard, Swaminathan, Karthik
Published in ECS transactions (12.08.2014)
Published in ECS transactions (12.08.2014)
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Journal Article
Evaluation of the Si0.8Ge0.2-on-Si Epitaxial Quality by Inline Surface Light Scattering: A Case Study on the Impact of Interfacial Oxygen
Wostyn, Kurt, Kenis, Karine, Rondas, Dirk, Loo, Roger, Hikavyy, Andriy Yakovitch, Dhayalan, Sathish, Douhard, Bastien, Mertens, Paul W., Holsteyns, Frank, De Gendt, Stefan, Simpson, Gavin, Bast, Gerhard, Swaminathan, Karthik
Published in ECS transactions (01.01.2014)
Published in ECS transactions (01.01.2014)
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Journal Article
Progress on background signal analysis of bare wafer inspection systems based on light scattering for III/V epitaxial growth monitoring
Halder, Sandip, Mols, Yves, van den Heuvel, Dieter, van Puymbroeck, Jan, Caymax, Matty, Vancoille, Eric, Nieuborg, Nancy, Bast, Gerhard, Simpson, Gavin, Peikert, Milko, Polli, Marco, Ulea, Neli, Seong Ho Yoo
Published in 25th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC 2014) (01.05.2014)
Published in 25th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC 2014) (01.05.2014)
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Conference Proceeding
Defect inspection challenges and solutions for ultra-thin SOI
Brun, R., Moulin, C., Schwarzenbach, W., Bast, G., Aristov, V., Belyaev, A.
Published in 2012 SEMI Advanced Semiconductor Manufacturing Conference (01.05.2012)
Published in 2012 SEMI Advanced Semiconductor Manufacturing Conference (01.05.2012)
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Conference Proceeding
Evaluation of the Si 0.8 Ge 0.2 -on-Si Epitaxial Quality by Inline Surface Light Scattering: A Case Study on the Impact of Interfacial Oxygen
Wostyn, Kurt, Kenis, Karine, Rondas, Dirk, Loo, Roger, Hikavyy, Andriy Yakovitch, Dhayalan, Sathish, Douhard, Bastien, Mertens, Paul W., Holsteyns, Frank, De Gendt, Stefan, Simpson, Gavin, Bast, Gerhard, Swaminathan, Karthik
Published in Meeting abstracts (Electrochemical Society) (05.08.2014)
Published in Meeting abstracts (Electrochemical Society) (05.08.2014)
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Journal Article