Modification of Ge-rich GeSbTe surface during the patterning process of phase-change memories
Canvel, Yann, Lagrasta, Sébastien, Boixaderas, Christelle, Barnola, Sébastien, Mazel, Yann, Dabertrand, Karen, Martinez, Eugénie
Published in Microelectronic engineering (15.01.2020)
Published in Microelectronic engineering (15.01.2020)
Get full text
Journal Article
Contact hole shrink by directed self-assembly: Process integration and stability monitored on 300 mm pilot line
Servin, Isabelle, Tiron, Raluca, Gharbi, Ahmed, Argoud, Maxime, Jullian, Karine, Chamiot-Maitral, Gaëlle, Barros, Patricia Pimenta, Chevalier, Xavier, Belledent, Jérôme, Bossy, Xavier, Moulis, Sylvain, Navarro, Christophe, Cunge, Gilles, Barnola, Sébastien, Asai, Masaya, Pieczulewski, Charles
Published in Japanese Journal of Applied Physics (01.06.2014)
Published in Japanese Journal of Applied Physics (01.06.2014)
Get full text
Journal Article
Etch adjustment for independent CD control in Double Patterning
Barnola, S., Lapeyre, C., Servin, I., McCallum, M., Magoon, H.
Published in 2009 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (01.05.2009)
Published in 2009 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (01.05.2009)
Get full text
Conference Proceeding
High-Performance High- K/Metal Planar Self-Aligned Gate-All-Around CMOS Devices
Pouydebasque, A., Denorme, S., Loubet, N., Wacquez, R., Bustos, J., Leverd, F., Deloffre, E., Barnola, S., Dutartre, D., Coronel, P., Skotnicki, T.
Published in IEEE transactions on nanotechnology (01.09.2008)
Published in IEEE transactions on nanotechnology (01.09.2008)
Get full text
Journal Article
METHOD FOR OBTAINING PATTERNS IN A LAYER
BARNOLA, Sébastien, DAVID, Thibaut, LANDIS, Stéphan, POSSEME, Nicolas, NOURI, Lamia
Year of Publication 23.08.2023
Get full text
Year of Publication 23.08.2023
Patent
Porous SiOCH integration: etch challenges with a trench first metal hard mask approach
Possémé, Nicolas, David, Thibaut, Chevolleau, Thierry, Darnon, Maxime, Brun, Philippe, Guillermet, Marc, Oddou, Jean Pierre, Barnola, Sébastien, Bailly, Fanny, Bouyssou, Régis, Ducote, Julien, Hurand, Romain, Vérove, Christophe, Joubert, Olivier R.
Published in ECS transactions (2011)
Published in ECS transactions (2011)
Get full text
Journal Article
High-Performance High-K/Μetal Planar Self-Aligned Gate-All-Around CMOS Devices
POUYDEBASQUE, Arnaud, DENORME, Stéphane, SKOTNICKI, Thomas, LOUBET, Nicolas, WACQUEZ, Romain, BUSTOS, Jessy, LEVERD, Francois, DELOFFRE, Emilie, BARNOLA, Sébastien, DUTARTRE, Didier, CORONEL, Philippe
Published in IEEE transactions on nanotechnology (2008)
Get full text
Published in IEEE transactions on nanotechnology (2008)
Journal Article
PRODUCTION OF SPACERS AT THE EDGES OF A TRANSISTOR GATE
BARNOLA, Sébastien, ARVET, Christian, POSSEME, Nicolas, LAGRASTA, Sébastien
Year of Publication 04.09.2019
Get full text
Year of Publication 04.09.2019
Patent
METHOD FOR SELECTIVE ETCHING OF A BLOCK COPOLYMER
BARNOLA, Sébastien, PIMENTA BARROS, Patricia, SARRAZIN, Aurélien, POSSEME, Nicolas
Year of Publication 24.07.2019
Get full text
Year of Publication 24.07.2019
Patent
METHOD OF FORMING A CONDUCTIVE TRENCH OR VIA
BARNOLA, Sébastien, MAGIS, Thomas, GAUCHER, François, POLLET, Olivier, CHAUVET, Nicolas
Year of Publication 06.03.2019
Get full text
Year of Publication 06.03.2019
Patent
METHOD FOR FORMING, ON A SINGLE SUBSTRATE, TRANSISTORS HAVING DIFFERENT CHARACTERISTICS
BARNOLA, Sébastien, JAUD, Marie-Anne, MAZURIER, Jérôme, GRENOUILLET, Laurent, POSSEME, Nicolas
Year of Publication 18.11.2020
Get full text
Year of Publication 18.11.2020
Patent
METHOD FOR FORMING PATTERNS BY IONS IMPLANTATIONS
BARNOLA, Sébastien, DAVID, Thibaut, LANDIS, Stefan, POSSEME, Nicolas, NOURI, Lamia
Year of Publication 02.01.2019
Get full text
Year of Publication 02.01.2019
Patent
METHOD FOR SELECTIVE ETCHING OF A BLOCK COPOLYMER
BARNOLA, Sébastien, PIMENTA BARROS, Patricia, SARRAZIN, Aurélien, POSSEME, Nicolas
Year of Publication 18.07.2018
Get full text
Year of Publication 18.07.2018
Patent