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Published in Proceedings of International Conference on Planarization/CMP Technology 2014 (01.11.2014)
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HIGH REMOVAL RATE CHEMICAL MECHANICAL POLISHING PADS FROM AMINE INITIATED POLYOL CONTAINING CURATIVES
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Year of Publication 11.06.2019
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Year of Publication 28.12.2017
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Year of Publication 28.12.2017
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METHODS OF MAKING CHEMICAL MECHANICAL POLISHING LAYERS HAVING IMPROVED UNIFORMITY
KANCHARLA ARUN K. REDDY, ANDREW WANK, DONNA MARIE ALDEN, BAINIAN QIAN, GEORGE C. JACOB, DAVID SHIDNER, MARTY W. DEGROOT
Year of Publication 09.11.2018
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Year of Publication 09.11.2018
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CHEMICAL MECHANICAL POLISHING PAD
TE CHUN WANG, FENGJI YEH, KEVIN WEN HUAN TUNG, BAINIAN QIAN, SHENG HUAN TSENG, MARTY W. DEGROOT
Year of Publication 11.10.2018
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Year of Publication 11.10.2018
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